23rd European Mask and Lithography Conference 2007
DOI: 10.1117/12.737179
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Assessment of EUV reticle blank availability enabling the use of EUV tools today and in the future

Abstract: With first full-field exposure tools for extreme ultraviolet lithography (EUVL) materializing, the present paper intends to review the status of the EUV mask infrastructure to assure timely availability of reticles, first for the alpha demo tool (ADT), but also in preparation for future use of EUV lithography in production. First, the major requirements such as low thermal expansion substrates, multilayer reflectivity control, flatness requirements and absorber related requirements are reviewed and motivated. … Show more

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Cited by 3 publications
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