1991
DOI: 10.1080/1047322x.1991.10389728
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Assessment of Extremely Low Frequency (ELF) Electric and Magnetic Fields in Microelectronics Fabrication Rooms

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Cited by 12 publications
(7 citation statements)
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“…This study also noted that cleanroom personnel whose average measured exposures were noticeably higher than other cleanroom workers were those working in the vicinity of diffusion furnaces. In fact, they noted this finding was consistent with point measurements reported by Rosenthal and Abdollahzadeh, [8] who found that diffusion furnaces produced proximity readings (2 inches away) as high as 100-150 mG, with the surrounding fields falling off more gradually with distance than other cleanroom equipment studied; even at six feet away from diffusion furnaces, the reported flux densities were 12-20 mG. [10] Figure 2 from the same study provides a bar graph representation of the mean time-weighted average (TWA) exposures for cleanroom personnel by process area. The plus symbol (+) shown is one standard deviation from the mean, and N equals the number of workers from whom data was collected.…”
Section: Extremely Low Frequency Electromagnetic Fields (Elf/emf)supporting
confidence: 90%
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“…This study also noted that cleanroom personnel whose average measured exposures were noticeably higher than other cleanroom workers were those working in the vicinity of diffusion furnaces. In fact, they noted this finding was consistent with point measurements reported by Rosenthal and Abdollahzadeh, [8] who found that diffusion furnaces produced proximity readings (2 inches away) as high as 100-150 mG, with the surrounding fields falling off more gradually with distance than other cleanroom equipment studied; even at six feet away from diffusion furnaces, the reported flux densities were 12-20 mG. [10] Figure 2 from the same study provides a bar graph representation of the mean time-weighted average (TWA) exposures for cleanroom personnel by process area. The plus symbol (+) shown is one standard deviation from the mean, and N equals the number of workers from whom data was collected.…”
Section: Extremely Low Frequency Electromagnetic Fields (Elf/emf)supporting
confidence: 90%
“…[11] Table 2 provides additional ELF magnetic field readings for selected pieces of equipment and at varying distances from the source. [8] Overall, the workers exposures to ELF magnetic fields measured in semiconductor fabrication cleanrooms were similar to those found in many other occupational settings. Personal dosimetry measurements on electric utility workers, as reported by the Electric Power Research Institute (EPRI), found mean exposure levels for most job tasks ranging between 1 and 10 mG, while average exposures of over 20 mG were reported for electrical workers involved in distribution and substation tasks.…”
Section: Extremely Low Frequency Electromagnetic Fields (Elf/emf)supporting
confidence: 72%
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“…Abdollahzadeh et al reported on observations over the course of three years that indicated that device and area ELF-MF levels remained relatively constant during that period. The range of average ELF-MF exposure levels reported in 1991 ( n = 50, 0.3–1.2 µT) [ 15 ] did not differ significantly from those in 1995 ( n = 142, 0.2–1.0 µT) [ 8 ]. The ELF-MF exposure levels recently reported by Chung et al were substantially similar to those reported in the 1990s.…”
Section: Discussionmentioning
confidence: 99%