2020
DOI: 10.3390/coatings10060531
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Assessment of Potential of the High-Voltage Anodic Plasma Source to Deposit Multilayer Structures Relevant to X-ray Mirror Applications

Abstract: (1) Background: The high-voltage anodic-plasma (HVAP) coating technique has a series of specificities that are not simultaneously met in other deposition methods. This paper aimed at assessing the potential of HVAP to synthesize quality multilayers for X-ray optics. (2) Methods: Nanolayers of W, Ta, B, and Si were deposited as mono-, bi-, and multilayers onto very smooth glass substrates by HVAP, and their thickness and density were analyzed by X-ray reflectometry. The minimal film thickness needed to obtain c… Show more

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