2022
DOI: 10.1016/j.apsusc.2022.154531
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Asymmetric interface and growth mechanism in sputtered W/Si and WSi2/Si multilayers

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Cited by 10 publications
(3 citation statements)
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“…Fittings using the distorted wave Born approximation (DWBA) quantitatively describe the characterizations of roughness structures with the lateral and vertical correlation lengths [11,20]. The fitting parameters are summarized in table 2.…”
Section: Resultsmentioning
confidence: 99%
“…Fittings using the distorted wave Born approximation (DWBA) quantitatively describe the characterizations of roughness structures with the lateral and vertical correlation lengths [11,20]. The fitting parameters are summarized in table 2.…”
Section: Resultsmentioning
confidence: 99%
“…Nano-multilayer architecture was reported to be an effective method to achieve the long-term wide-range temperature selflubricant properties [42]. This design depending on the layer materials is able to (i) inhibit the heat flows induced by the frictional heat sources during the wear test [43][44][45], (ii) work as a barrier layer to avoid the strong diffusion of soft metal to the surface [46][47][48] and (iii) enhance the wear-resistance by changing the wear mechanism due to the formation of the transition zones between the adjacent layers, which can hinder crack propagation or even relax them [49] and (iv) increase hardness if the superlattice effect is reached [27]. Barrier layers have been applied to avoid the strong diffusion of soft metal to the surface and thus achieve the long-term self-lubrication properties at wide range of temperatures.…”
Section: Introductionmentioning
confidence: 99%
“…An added advantage of W/B4C is that it generally tends to form more sharp interfaces compared to materials deposited as elements, such as W/C [51]. This is because multilayers deposited directly as a compound tend to have less interdiffusion between the spacer and absorber [54]. Other W-based material combinations, such as W/B and W/Al, are less common, and therefore, not studied as much.…”
Section: Challengesmentioning
confidence: 99%