Atmospheric plasma deposition of diamond-like carbon coatings

Plasmachemical synthesis in low-temperature atmospheric pressure plasma

“…Syntheses can be performed in reactors with a plane parallel electrode configuration. Substrates may be placed both directly in the plasma region [93,111] and beyond this region (socalled remote plasma processes) [112][113][114][115][116][117][118]. Certain tasks seem to be better solved in reactors with coaxial electrodes [119].…”

“…Diamond-like films were synthesized by directly delivering the reaction gas mixture to the RF plasma zone (27.12 MHz, 160 W) [112]. The plasma-forming gas was helium (30 L/min), and the reagent gases were hydrogen (0.5 L/min) and acetylene (50-100 mL/min).…”

“…The authors of [112][113][114][115][116] used a deposition set-up in which remote RF plasma was generated between perforated plane parallel electrodes. The characteristic feature of the set-up was that the gas mixture could be introduced both directly to the discharge and to the afterglow zone.…”

Friction Characteristics of Amorphous Carbon Films on Rubber Deposited by Cold Atmospheric Pressure Plasma

“…If the process can be performed under atmospheric pressure, the cost for coating can be reduced and the restrictions concerning the size and shape of objects to be deposited can be relaxed and the productivity of coating process will be greatly improved. For that purpose, many studies have been made in recent years and some successful cases of amorphous carbon film deposition under atmospheric pressure have been reported [4][5][6][7][8]. One of them is the deposition of super hard DLC film under the pressure more than 10 GPa, which is said to be difficult to realize under atmospheric pressure [9].…”

Deposition of Thin Films from Amino Group Containing Precursors with an Atmospheric Pressure Microplasma Jet

“…Therefore, discharges at atmospheric pressure, especially non‐thermal plasmas have been of increasing interest in the past years. Thin film deposition at atmospheric pressure is reported for various precursors, e.g., for SiO x 1–5, C:F6 and C:H films 7, 8. Processes that generate amino group containing films are specifically desirable for biomedical purposes, as such thin films enhance the cell adhesion for example on implants 9, 10.…”