Atmospheric Plasma Deposition Process: A Versatile Tool for the Design of Tunable Siloxanes‐Based Plasma Polymer Films

Petersen, Julien; Bechara, R.; Bardon, Julien; Fouquet, Thierry; Ziarelli, Fabio; Dahéron, Laurence; Ball, Vincent; Toniazzo, Valérie; Michel, M. F.; Dinia, A.; Ruch, David

doi:10.1002/ppap.201100022

Cited by 32 publications

(38 citation statements)

References 79 publications

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“…This is well emphasized for the k C i (H,Me) series annotated with k in open squares in Figure 7, with a major 1 C 9 (H,Me) at m/z 760.2 in ppHMDSO‐1 (Figure 7a) and a major 5 C 6 (H,Me) at m/z 778.0 in ppHMDSO‐3 (Figure 7c). This result is consistent with the production of plasma polymers with an increasing inorganic character when increasing the amount of energy per monomer in the atmospheric pressure plasma 22. The inorganic character of silicon‐based plasma polymerized samples is usually evaluated by solid state NMR, by comparing relative intensities of signals assigned to M, D, T, and Q in NMR spectra obtained for different films.…”

Section: Resultssupporting

confidence: 70%

“…The plasma polymerized films were deposited using a semi‐dynamic dielectric barrier discharge (DBD) reactor at open atmosphere described in previous studies 4, 11, 22. The DBD discharge was generated between an earthed bottom aluminum plate and two high‐voltage aluminum top plates with a surface of 300.08 cm 2 (34.1 × 8.8 cm 2 for one electrode) protected by a glass plate which serves as a dielectric barrier.…”

Section: Methodsmentioning

confidence: 99%

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Insights in the Architecture of Silicon‐Based Plasma Polymers Using Partial Network Ethanolysis Combined with Electrospray Tandem Mass Spectrometry

Fouquet

Petersen²,

Ziarelli

et al. 2013

Plasma Processes & Polymers

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International audienceThin films obtained upon plasma polymerization of D4 and HMDSO precursors at atmospheric pressure are submitted to controlled ethanolysis to produce oligomers amenable to electrospray mass spectrometry. When using high resolution mass spectrometry to assess their elemental composition and tandem mass spectrometry to characterize their end-groups, a whole set of ethanolysis products is identified, from which the network connectivity in the original film can be reconstructed. Ethanolysis products of ppD4 and ppHMDSO exhibit the same structural features composed of linear and cross-linked PDMS moieties, the extent of cross-linking reflecting the inorganic character of the film. Oligomers originally embedded in the solid network and released as intact species upon its dissolution are also observed. [GRAPHICS]

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Section: Resultssupporting

confidence: 70%

Section: Methodsmentioning

confidence: 99%

Insights in the Architecture of Silicon‐Based Plasma Polymers Using Partial Network Ethanolysis Combined with Electrospray Tandem Mass Spectrometry

Fouquet

Petersen²,

Ziarelli

et al. 2013

Plasma Processes & Polymers

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“…In preceding articles, we reported that several groups attempted to apply the W / FM concept to AP PP, using values of W determined from Lissajous figures or related techniques . This entails at least two difficulties: (i) accurate power measurements in DBD plasmas are error‐prone; (ii) even if W is determined with care, it includes both the carrier gas and the monomer.…”

Section: Introductionmentioning

confidence: 99%

Energetics of Reactions in a Dielectric Barrier Discharge with Argon Carrier Gas: III Esters

Nisol

Watson

Lerouge

et al. 2016

Plasma Process. Polym.

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A large research reactor for dielectric barrier discharge (DBD) experiments at atmospheric pressure (AP) has been used with argon (Ar) carrier gas under constant plasma conditions (f = 20 kHz, Va(f) = 8 kVp‐p = 2.8 kVrms). Five esters, acrylates with differing number of unsaturations were used as “monomers”; monomer flows, Fd, were at ‰ concentrations in the F = 10 standard liters per minute (slm) of argon. We earlier perfected and reported a method for measuring Eg, the energy dissipated per cycle of the applied a.c. voltage, and ΔEg, the energy difference with and without monomer in the Ar flow. The latter, combined with Fd enable calculation of Em, the average energy absorbed from the plasma per monomer molecule. Plots of Em versus Fd and 1/Fd yield much valuable information, for example about the role of CC and CC bonds in fragmentation and polymerization reactions. Fourier‐transform infrared (FTIR) spectroscopy, spectroscopic ellipsometry (SE), and scanning electron microscopy (FEG‐SEM) further enhance and complement data interpretation.

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“…11,12 Apart from its extensive use in low-pressure plasma polymerization, W/FM is currently used by several research groups as a deposition parameter for atmospheric pressure plasma polymerization, [13][14][15][16][17][18][19][20][21] where the precursor is diluted in an inert gas. This preliminary work challenges the use of the W/FM parameter for atmospheric plasma as used by several authors, [13][14][15][16][17][18][19][20][21] including the present authors, and opens new lines of inquiry in the further study of plasma parameters at atmospheric pressure. 12 In this work, allyl methacrylate (AMA) was deposited by means of an atmospheric plasma Dielectric Barrier Discharge (DBD).…”

Section: Introductionmentioning

confidence: 99%

Evaluation of the Yasuda parameter for the atmospheric plasma deposition of allyl methacrylate

et al. 2015

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This work studies the influence of the proportional change in discharge power and the monomer feed on the morphology and the chemistry of atmospheric plasma deposited films. Atmospheric plasma coatings of allyl methacrylate were deposited using dielectric barrier discharge plasma under different conditions but always under the same ratio between the discharge power and monomer feed (W/FM). It is shown that a constant W/FM does not necessarily provide the same chemistry and the same morphology for atmospheric pressure plasma. This is explained by the higher discharge power of the plasma resulting in an increase of streamers which alter the distribution of energy among the plasma species. On the surface of the deposited coatings, globular-like features were observed, which are suggested to be formed in the volume of the discharge. The deposition rate is also influenced. providing thicker coatings, when high monomer feed/high power are used. Finally, infrared spectra showed a higher retention of the ester functionality at high power/high monomer feed.

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Atmospheric Plasma Deposition Process: A Versatile Tool for the Design of Tunable Siloxanes‐Based Plasma Polymer Films

Cited by 32 publications

References 79 publications

Insights in the Architecture of Silicon‐Based Plasma Polymers Using Partial Network Ethanolysis Combined with Electrospray Tandem Mass Spectrometry

Insights in the Architecture of Silicon‐Based Plasma Polymers Using Partial Network Ethanolysis Combined with Electrospray Tandem Mass Spectrometry

Energetics of Reactions in a Dielectric Barrier Discharge with Argon Carrier Gas: III Esters

Evaluation of the Yasuda parameter for the atmospheric plasma deposition of allyl methacrylate

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