2021
DOI: 10.1039/d1ra05672g
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Atmospheric pressure chemical vapor deposition growth of vertically aligned SnS2 and SnSe2 nanosheets

Abstract: SnS2 and SnSe2 nanosheets were synthesized vertically aligned in different substrates by an AP-CVD method.

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Cited by 16 publications
(10 citation statements)
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“…S5b and S5e † present the Sn 3d 5/2 and 3d 3/2 doublet located at 486.14 and 494.54 eV confirming the successful doping of Sn 4+ into Li 5 MSe 4 . 25 Finally, the Se 3d spectra (Fig. S5c and S5f †) with 3d 5/2 and 3d 3/2 at energies 53.39 and 54.32 eV indicate the presence of the Se 2− state signifying the complete reduction of Se to Se 2− in both the compounds, III and IV.…”
Section: Paper Dalton Transactionsmentioning
confidence: 85%
“…S5b and S5e † present the Sn 3d 5/2 and 3d 3/2 doublet located at 486.14 and 494.54 eV confirming the successful doping of Sn 4+ into Li 5 MSe 4 . 25 Finally, the Se 3d spectra (Fig. S5c and S5f †) with 3d 5/2 and 3d 3/2 at energies 53.39 and 54.32 eV indicate the presence of the Se 2− state signifying the complete reduction of Se to Se 2− in both the compounds, III and IV.…”
Section: Paper Dalton Transactionsmentioning
confidence: 85%
“…To investigate the chemical states of the fabricated SnS 2 nanosheets, X-ray photoelectron spectroscopy (XPS) is accomplished with the Al Ka X-ray source ( h ν = 1486.6 eV) operating at a vacuum pressure about 10 –7 Pa. The electron peaks of pristine SnS 2 related to the binding energies of Sn 3d5/2, Sn 3d3/2, S 2p3/2, and S 2p1/2 are 486.7, 494.8, 161.6 eV, and 162.3, respectively (Figure d), which is in accordance with the earlier report . The high-resolution S2p core level analysis shows the two peaks of S2p3/2 and S2p1/2, which corresponds to the binding energies of 161.2 and 162.3 eV, respectively, as presented in Figure S1a.…”
Section: Methodsmentioning
confidence: 99%
“…19 Unlike atmospheric pressure chemical vapor deposition (APCVD), the operating temperatures in LPCVD are comparatively low, resulting in reaction rate-controlled growth rather than diffusion-controlled growth. 20 The positive outcomes of LPCVD comprise better uniformity in terms of the thickness of film and composition homogeneity. Therefore, in this work, we have utilized LPCVD for the growth of tin selenide.…”
Section: Introductionmentioning
confidence: 99%
“…As a consequence, optoelectronic devices with different phases of the same material significantly differ in their performance parameters. Therefore, efforts have been rendered recently to control the phase of MCs by using the low-pressure chemical vapor deposition (LPCVD) growth method . Unlike atmospheric pressure chemical vapor deposition (APCVD), the operating temperatures in LPCVD are comparatively low, resulting in reaction rate-controlled growth rather than diffusion-controlled growth . The positive outcomes of LPCVD comprise better uniformity in terms of the thickness of film and composition homogeneity.…”
Section: Introductionmentioning
confidence: 99%