Atmospheric Pressure CVD of Molybdenum Diselenide Films on Glass

Boscher, Nicolas D.; Carmalt, Claire J.; Palgrave, Robert G.; Gil-Tomás, Jesús J.; Parkin, Ivan P.

doi:10.1002/cvde.200606502

Cited by 53 publications

(36 citation statements)

References 23 publications

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“…Water droplets of up to 100 mg were stationary at a 908 tip angle. This unusual wetting be- www.chemeurj.org haviour was, however, not demonstrated by similar diselenide systems (TiSe 2 , [105] VSe 2 , [106] NbSe 2 , [107] MoSe 2 [108] ). The formation of poly-p-xylylenes is a contrasting example of a Cassie-Baxter wetting surface.…”

Section: Breakdown Of Trimethyla C H T U N G T R E N N U N G Meth-mentioning

confidence: 85%

Preparation and Characterisation of Super‐Hydrophobic Surfaces

Crick

Parkin

2010

Chemistry A European J

284

171

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The interest in highly water-repellent surfaces has grown in recent years due to the desire for self-cleaning surfaces. A super-hydrophobic surface is one that achieves a water contact angle of 150 degrees or greater. This article explores the different approaches used to construct super-hydrophobic surfaces and identifies the key properties of each surface that contribute to its hydrophobicity. The models used to describe surface interaction with water are considered, with attention directed to the methods of contact angle analysis. A summary describing the different routes to hydrophobicity is also given.

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Section: Breakdown Of Trimethyla C H T U N G T R E N N U N G Meth-mentioning

confidence: 85%

Preparation and Characterisation of Super‐Hydrophobic Surfaces

Crick

Parkin

2010

Chemistry A European J

284

171

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“…by gas source CVD, there has been renewed interest in its use for the synthesis of monolayer and few-layer chalcogenide films such as MoS2 [75][76][77] and WSe2. [78][79][80][81] A variety of precursors have been employed for the growth of 2D materials including metal carbonyls (W(CO)6 75,80 and Mo(CO)6 [75][76][77] ), halides (MoCl5, 66 WCl6, 65,78 NbCl5 68 ), metalorganics ((CH3)3Bi, 62,82,83 ), organo-chalcogen compounds ((CH3)2Se, 80 , (C2H5)2Se, 65,78,82,84 (C4H9)2Se, 66,68 (C2H5)2S, 75 (C4H9)2S, 77 (C2H5)2Te, 83,85 (C3H7)2Te 62 ), and hydrides (H2S, 76 H2Se 80 ). Except for the hydrides which are supplied as gases, the precursors are typically liquids or solids at room temperature with low to moderate vapor pressure.…”

Section: Milestonesmentioning

confidence: 99%

A roadmap for electronic grade 2D materials

et al. 2019

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Since their modern debut in 2004, 2-dimensional (2D) materials continue to exhibit scientific and industrial promise, providing a broad materials platform for scientific investigation, and development of nano-and atomic-scale devices. A significant focus of the last decade's research in this field has been 2D semiconductors, whose electronic properties can be tuned through manipulation of dimensionality, substrate engineering, strain, and doping. 1-8 2D semiconductors such as molybdenum disulfide (MoS2) and tungsten diselenide (WSe2) have dominated recent interest for potential integration in electronic technologies, due to their intrinsic and tunable properties, atomic-scale thicknesses, and relative ease of stacking to create new and custom structures. However, to go "beyond the bench", advances in large-scale, 2D layer synthesis and engineering must lead to "exfoliation-quality" 2D layers at the wafer scale. This roadmap aims to address this grand challenge by identifying key technology drivers where 2D layers can have an impact, and to discuss synthesis and layer engineering for the realization of electronic-grade, 2D materials. We focus on three fundamental areas of research that must be heavily pursued in both experiment and computation to achieve high-quality materials for electronic and optoelectronic applications. The document is organized as follows:

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“…Therefore, it is significant to study the electrical properties of MoSe 2 . Up to now, many preparatory techniques have been used to obtain the MoSe 2 films, such as chemical vapor deposition (CVD), sputtering and electrodeposition and chemical bath deposition (CBD) [4][5][6][7][8]. The radio frequency (RF) magnetron sputtering method is emerged as an important method due to the high deposition rate, large area deposition and good physical and chemical properties of the films.…”

Section: Introductionmentioning

confidence: 99%