2005
DOI: 10.1103/physreva.72.023417
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Atom nanolithography with multilayer light masks: Particle optics analysis

Abstract: We study the focusing of atoms by multiple layers of standing light waves in the context of atom lithography. In particular, atomic localization by a double-layer light mask is examined using the optimal squeezing approach. Operation of the focusing setup is analyzed both in the paraxial approximation and in the regime of nonlinear spatial squeezing for the thin-thin as well as thinthick atom lens combinations. It is shown that the optimized double light mask may considerably reduce the imaging problems, impro… Show more

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Cited by 9 publications
(16 citation statements)
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“…1. Many aspects of atom focusing by the standing light waves can be explained in the semiclassical picture of the atom's interaction with the light induced potential [4,5,16]. Therefore, we start considering the problem in the classical framework.…”
Section: Focusing Of Atoms By Adiabatic Light Potentials: Classicmentioning
confidence: 99%
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“…1. Many aspects of atom focusing by the standing light waves can be explained in the semiclassical picture of the atom's interaction with the light induced potential [4,5,16]. Therefore, we start considering the problem in the classical framework.…”
Section: Focusing Of Atoms By Adiabatic Light Potentials: Classicmentioning
confidence: 99%
“…II, the basic framework of the problem is defined and the focusing of atoms is studied classically under the influence of adiabatic light potentials. In this section, we examine the optimal squeezing scheme of [16] when applied to the atomic-beam traversing a near-resonant SW light. In Sec.…”
Section: Introductionmentioning
confidence: 99%
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