Surf. Interface Anal.
 1999
DOI: 10.1002/(sici)1096-9918(199910)27:10<881::aid-sia644>3.0.co;2-6
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Atomic force microscopy and high-resolution RBS investigation of the surface modification of magnetron sputter-etched Si(111) in an argon plasma at different pressures

Prakash Deenapanray1,
K.T. Hillie2,
C. M. Demanet3
et al.
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