Atomic layer controlled growth of SiO2 films using binary reaction sequence chemistry

Abstract

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SiO2 film growth at low temperatures by catalyzed atomic layer deposition in a viscous flow reactor

“…For the (A) reaction during SiO 2 ALD, the surface is covered by hydroxyl (SiOH*) groups and SiCl 4 reacts with these SiOH* species to deposit SiCl* species on the surface [5,6]. During the catalyzed SiCl 4 reaction, pyridine forms hydrogen bonds with the SiOH* species and makes the oxygen a stronger nucleophile [7,8].…”

“…binary sequence to grow SiO 2 . A maximum growth rate of 1.1 Å per AB cycle was measured at 600 K [6]. This SiO 2 ALD chemistry has been used to coat BN particles [10] and reduce the pore size of inorganic membranes [11].…”

Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties

“…17,18 In recent years, various alternative Si precursors have been tested in combination with O 3 or H 2 O as the oxidants. These processes include the use of pyridine (C 5 H 5 N) and Al as catalysts on the surface.…”

“…These processes include the use of pyridine (C 5 H 5 N) and Al as catalysts on the surface. 17,11,19 The approach employing Al was referred to as rapid ALD as it resulted in deposition rates above the "theoretical" maximum of one monolayer per ALD cycle. In addition, more recently a thermal ALD process for lowtemperature SiO 2 was reported which was free of catalysts or corrosive by-products.…”

Detection of gain enhancement in laser-induced fluorescence of rhodamine B lasing dye by silicon dioxide nanostructures-coated cavity

“…The unique properties of this dye have attracted the attention of researchers in several military, medical, and industrial applications The fluorescence lifetime of this dye is about 4.08 × 10 -9 s, which means that the possibility of inter-system crossing is very weak (< 10 7 s -1 ) [13]. Using rhodamine dye as an active media of dye laser, it is possible to obtain continuous or pulsed laser output according to the pumping method in which a wide tunable wavelengths range can be obtained [14,15]. Random laser has received much attention as a new development of laser physics and technology [16].…”