Atomic Layer Deposition (ALD) as a Way to Prepare New Mixed-Oxide Catalyst Supports: The Case of Alumina Addition to Silica-Supported Platinum for the Selective Hydrogenation of Cinnamaldehyde

Weng, Zhihuan; Zaera, Francisco

doi:10.1007/s11244-019-01163-4

Cited by 25 publications

(25 citation statements)

References 94 publications

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“…285,286 Apart from electrochemical energy-storage applications, ALD is actively used to improve the catalytic performance of materials by either depositing metal nanoparticles onto their top surface 287,288 or (partial) overcoating them with an oxide layer. 278,[289][290][291][292][293] The growth of single nanoparticles on carbon or oxide surfaces is usually achieved at comparably high deposition temperatures, where the precursor tends to agglomerate depending on the presence of surface defects and the atmospheric conditions instead of forming a conformal coating during the initial ALD cycles. [294][295][296] In case of partial overcoating, one takes advantage of differences in surface chemistry of the solid (area-selective deposition, also referred to as AS-ALD).…”

Section: Surface Modificationmentioning

confidence: 99%

Ordered mesoporous metal oxides for electrochemical applications: correlation between structure, electrical properties and device performance

Celik

Brezesinski

et al. 2021

Phys. Chem. Chem. Phys.

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Section: Surface Modificationmentioning

confidence: 99%

Ordered mesoporous metal oxides for electrochemical applications: correlation between structure, electrical properties and device performance

Celik

Brezesinski

et al. 2021

Phys. Chem. Chem. Phys.

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“…[23] Small amounts of Al 2 O added to SiO 2 (and vice-versa), have been demonstrated to enable unique reactivity, attributed to the formation of new active sites and interfaces with metal nanoparticles (including a possible interface with aluminum silicate). [24] In this system, we speculate that the sub-monolayer quantities of Al 2 O 3 enable the Co nanoparticles to interact with both the SiO 2 and Al 2 O 3 in a synergistic way that results in an enhancement in oxygenate selectivity. Further study would be required to confirm this effect.…”

Section: Elucidating Structure/activity Of Zno-modified Co/al 2 Omentioning

confidence: 80%

Understanding Support Effects of ZnO‐Promoted Co Catalysts for Syngas Conversion to Alcohols Using Atomic Layer Deposition

et al. 2020

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Co2C, an emerging catalyst for the conversion of syngas to oxygenates, shows support‐sensitive behavior that has not yet been fully explained. Here, we characterize Co catalysts modified with ZnO atomic layer deposition on SiO2, carbon, CeO2, and Al2O3 supports. We find that under syngas conditions, ZnO‐promoted Co transforms into Co2C on SiO2, carbon, and CeO2, but not on Al2O3. Moreover, the support affects the extent of carburization: while the SiO2‐supported catalyst carburizes completely, carbon‐ and CeO2‐supported catalysts show incomplete conversion of Co to Co2C. These three catalysts also exhibit different oxygenate selectivities. In contrast, the modified Al2O3‐supported catalyst retains the Fischer‐Tropsch catalytic properties of metallic Co. By depositing increasing amounts of Al2O3 by ALD on the SiO2 support, decreasing Co2C formation and oxygenate selectivity occurs. In‐situ XANES reveals that Al2O3 prevents Co2C formation by enabling the ZnO to restructure into ZnAl2O4 during reduction. Thus, in addition to modifying the active catalyst phase, the promoter can also strongly interact with the support, significantly impacting catalyst performance.

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“…ALD has been used in catalysis to produce catalyst support, [ 153 ] catalyst thin films as well as isolated clusters, and atomically dispersed single atoms. [ 154 ] Its main advantages over conventional solution‐based techniques are the application of the catalyst layers or clusters on particles and porous materials.…”

Section: Catalystmentioning

confidence: 99%

Atomic Layer Deposition for the Photoelectrochemical Applications

Pastukhova

Mavrič

2021

Adv Materials Inter

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Substantial progress has been made in the photoelectrochemical (PEC) field to understand the photoelectrode behavior, semiconductor‐electrolyte interface, and photocorrosion, enabling new photoelectrode architectures with higher photocurrent, reduced photovoltage losses, and longer lifetime. Nevertheless, for practical PEC applications additional efforts are still needed to optimize all components of the photoelectrodes, including the light absorbing semiconductors, the layers for charge extraction, charge transfer, corrosion protection, and catalysis. In this regard, atomic layer deposition (ALD) offers new opportunities due to the monolayer‐by‐monolayer deposition approach, allowing preparation of conformal films with precisely controlled thickness and composition. As the ALD instruments are becoming widely accessible, this review aims to make an overview of the applications for photoelectrodes fabrication. The deposition of semiconductors onto flat and nano‐textured substrates, the deposition of ultrathin interlayers to ease charge transport by energy band alignment and surface states passivation, the deposition of corrosion protection layers, and finally, the possibilities for high catalyst dispersion is presented.

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Atomic Layer Deposition (ALD) as a Way to Prepare New Mixed-Oxide Catalyst Supports: The Case of Alumina Addition to Silica-Supported Platinum for the Selective Hydrogenation of Cinnamaldehyde

Cited by 25 publications

References 94 publications

Ordered mesoporous metal oxides for electrochemical applications: correlation between structure, electrical properties and device performance

Ordered mesoporous metal oxides for electrochemical applications: correlation between structure, electrical properties and device performance

Understanding Support Effects of ZnO‐Promoted Co Catalysts for Syngas Conversion to Alcohols Using Atomic Layer Deposition

Atomic Layer Deposition for the Photoelectrochemical Applications

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