2023
DOI: 10.35848/1347-4065/acce43
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Atomic layer deposition and its derivatives for extreme ultraviolet (EUV) photoresist applications

Abstract: Solution-processed photoresists have been forerunners in semiconductor patterning for decades. Even with the drastic reduction in photolithography wavelength, traditional spin-on resists still support the fabrication of the most advanced, sub-5nm node logic and memory devices using EUVL (λ=13.5nm). However, trade-off between resolution, sensitivity, and roughness in the conventional resists pose a critical challenge in the race towards device downscaling to 1nm node. While great efforts are being made to impro… Show more

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Cited by 6 publications
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