Atomic layer deposition of Al2O3 and HfO2 for high power laser application

Liu, Hao; Ma, Ping; Pu, Yong; Zhao, Zuzhen

doi:10.1016/j.jallcom.2020.157751

Cited by 10 publications

(6 citation statements)

References 20 publications

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“…High-index HfO 2 film exhibits 2.01 at 355 nm and 1.93 at 1064 nm wavelengths, whereas SiO 2 marked 1.47 at 355 nm and 1.45 at 1064 nm wavelengths as the refractive indices. These results are consistent with the refractive indices, with a little deviation (due to different deposition methods and process parameters) reported by other authors [50,79,80]. The knowledge obtained from the single-layer thin films was then applied to deposition of heterostructures.…”

Section: Resultssupporting

confidence: 90%

“…An amorphous state of the thin film is desired in optical coatings because crystalline films generate grain boundaries which lead to losses due to scattering and absorption [26,47,48]. HfO 2 films tend to crystallize at a relatively low deposition temperature, as reported by several authors [49,50]. The previous work from our group reported on the thickness and temperature-dependent crystallinity of pure HfO 2 [51].…”

Section: Introductionmentioning

confidence: 79%

“…They observed that HfO 2 deposited by ALD results in 31.8 J/cm 2 at 1064 nm wavelength with 3 ns pulses. Liu et al also reported an LIDT of 14 J/cm 2 [S-on-1, 1064 nm, 10 ns] for HfO 2 grown by ALD [50]. The LIDT was different in the UV and NIR spectral range due to the different laser conditioning parameters, test methods, as well as deposition processes [3,39,92,93].…”

Section: Damage Performance Of Sio 2 :Hfo 2 Heterostructuresmentioning

confidence: 99%

“…The absorption values obtained from these techniques are summarized in Table 6. Measurements using the PCI technique provide a difference of 6.5 ppm between the graded and multilayer stack [50]. This method considered coatings that did not undergo annealing at a higher temperature.…”

Section: Antireflection Coatingsmentioning

confidence: 99%

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Heterostructure Films of SiO2 and HfO2 for High-Power Laser Optics Prepared by Plasma-Enhanced Atomic Layer Deposition

et al. 2023

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Absorption losses and laser-induced damage threshold (LIDT) are considered to be the major constraints for development of optical coatings for high-power laser optics. Such coatings require paramount properties, such as low losses due to optical absorption, high mechanical stability, and enhanced damage resistance, to withstand high-intensity laser pulses. In this work, heterostructures were developed by sub-nanometer thin films of SiO2 and HfO2 using the plasma-enhanced atomic layer deposition (PEALD) technique. Thin-film characterization techniques, such as spectroscopic ellipsometry, spectrophotometry, substrate curvature measurements, X-ray reflectivity, and Fourier transform infrared spectroscopy, were employed for extracting optical constants, residual stress, layer formation, and functional groups present in the heterostructures, respectively. These heterostructures demonstrate tunable refractive index, bandgap, and improved optical losses and LIDT properties. The films were incorporated into antireflection coatings (multilayer stacks and graded-index coatings) and the LIDT was determined at 355 nm wavelength by the R-on-1 method. Optical absorptions at the reported wavelengths were characterized using photothermal common-path interferometry and laser-induced deflection techniques.

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Section: Resultssupporting

confidence: 90%

Section: Introductionmentioning

confidence: 79%

Section: Damage Performance Of Sio 2 :Hfo 2 Heterostructuresmentioning

confidence: 99%

Section: Antireflection Coatingsmentioning

confidence: 99%

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Heterostructure Films of SiO2 and HfO2 for High-Power Laser Optics Prepared by Plasma-Enhanced Atomic Layer Deposition

et al. 2023

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“…Extensive research has been conducted on aluminum oxide as a thin-film material with diverse applications, including protective coatings [1,2], diffusion barriers [3][4][5], and electronic and optical devices [6][7][8][9]. Crystalline Al 2 O 3 films offer clear advantages in applications that require elevated chemical stability [2,10], specific optical or electronic attributes [7,11,12], and superior mechanical properties [13,14].…”

Section: Introductionmentioning

confidence: 99%

Study of Mid-Pressure Ar Radiofrequency Plasma Used in Plasma-Enhanced Atomic Layer Deposition of α-Al2O3

Piller,

Raud,

Aarik

et al. 2024

Processes

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This study investigated the characteristics of radiofrequency, middle-pressure argon plasma used in the atomic layer deposition (ALD) of Al2O3 films. Based on the electrical characteristics—the current, voltage, and phase shift between them—and the stability of the plasma plume, the optimum plasma power, allowing reliable switching on of the plasma for any step of an ALD cycle, was determined. Spectral measurements were performed to determine the gas temperature and reactive species that could be important in the ALD process. The density of metastable argon atoms was estimated using tunable laser absorption spectroscopy. It was concluded that plasma heating of substrates did not affect film growth. The crystallization-enhancing effect of plasma observed in these experiments was due to the action of OH radicals produced in the plasma.

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Flexible nanoporous antireflection coatings prepared from controllable latex aggregation and their efficient color deepening function

Yang

Song

et al. 2021

Colloids and Surfaces A: Physicochemical and Engineering Aspect

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Atomic layer deposition of Al2O3 and HfO2 for high power laser application

Cited by 10 publications

References 20 publications

Heterostructure Films of SiO2 and HfO2 for High-Power Laser Optics Prepared by Plasma-Enhanced Atomic Layer Deposition

Heterostructure Films of SiO2 and HfO2 for High-Power Laser Optics Prepared by Plasma-Enhanced Atomic Layer Deposition

Study of Mid-Pressure Ar Radiofrequency Plasma Used in Plasma-Enhanced Atomic Layer Deposition of α-Al2O3

Flexible nanoporous antireflection coatings prepared from controllable latex aggregation and their efficient color deepening function

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