Atomic layer deposition of Al_2O_3 and TiO_2 multilayers for applications as bandpass filters and antireflection coatings

Szeghalmi, Adriana; Helgert, Michael; Brunner, Róbert; Heyroth, Frank; Gösele, U.; Knez, Mato

doi:10.1364/ao.48.001727

Cited by 127 publications

(74 citation statements)

References 14 publications

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“…Al 2 O 3 has been applied in ALD antireflection coatings in combination with TiO 2 [17,20] or Ta 2 O 5 [28]. Next to this, SiO 2 is a very important low-index material that we recently applied in ALD optical coatings [19,21,28,29].…”

Section: Characterization Of Ald Thin Filmsmentioning

confidence: 99%

“…Note that no in situ control of the film thicknesses has been applied during the ALD process. In situ monitoring might be necessary for more complex AR coatings or interference coatings such as narrow bandpass filters or dichroic mirrors [20,21]. Table 2.…”

Section: Antireflection Coatings On Plane Glass Substratesmentioning

confidence: 99%

“…We have previously shown a broadband AR coating on flat high refractive index glasses using SiO2/HfO2 multilayers [19]. Atomic layer deposition is also being considered for more complex interference coatings such as dichroic mirrors and narrow bandpass filters [16,20,21]. Atomic layer deposition is a modified form of chemical vapor deposition, where the precursors are sequentially exposed to the surface until saturation is reached [22].…”

Section: Introductionmentioning

confidence: 99%

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Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition

et al. 2017

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Antireflection (AR) coatings are indispensable in numerous optical applications and are increasingly demanded on highly curved optical components. In this work, optical thin films of SiO 2 , Al 2 O 3 , TiO 2 and Ta 2 O 5 were prepared by atomic layer deposition (ALD), which is based on self-limiting surface reactions leading to a uniform film thickness on arbitrarily shaped surfaces. Al 2 O 3 /TiO 2 /SiO 2 and Al 2 O 3 /Ta 2 O 5 /SiO 2 AR coatings were successfully applied in the 400-750 nm and 400-700 nm spectral range, respectively. Less than 0.6% reflectance with an average of 0.3% has been measured on a fused silica hemispherical (half-ball) lens with 4 mm diameter along the entire lens surface at 0 • angle of incidence. The reflectance on a large B270 aspherical lens with height of 25 mm and diameter of 50 mm decreased to less than 1% with an average reflectance < 0.3%. The results demonstrate that ALD is a promising technology for deposition of uniform optical layers on strongly curved lenses without complex in situ thickness monitoring.

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Section: Characterization Of Ald Thin Filmsmentioning

confidence: 99%

Section: Antireflection Coatings On Plane Glass Substratesmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition

et al. 2017

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“…A unique advantage of ALD method is the ability to uniformly deposit on geometrically complex surfaces [9][10][11]. For this reason, atomic layer deposition method may be used for deposition of the optical thin film on the silicon solar cells as antireflection coating.…”

Section: Introductionmentioning

confidence: 99%

Silicon solar cells with Al2O3 antireflection coating

2014

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Abstract:The paper presents the possibility of using Al 2 O 3 antireflection coatings deposited by atomic layer deposition ALD. The ALD method is based on alternate pulsing of the precursor gases and vapors onto the substrate surface and then chemisorption or surface reaction of the precursors. The reactor is purged with an inert gas between the precursor pulses. The Al 2 O 3 thin film in structure of the finished solar cells can play the role of both antireflection and passivation layer which will simplify the process. For this research 50x50 mm monocrystalline silicon solar cells with one bus bar have been used. The metallic contacts were prepared by screen printing method and Al 2 O 3 antireflection coating by ALD method. Results and their analysis allow to conclude that the Al 2 O 3 antireflection coating deposited by ALD has a significant impact on the optoelectronic properties of the silicon solar cell. For about 80 nm of Al 2 O 3 the best results were obtained in the wavelength range of 400 to 800 nm reducing the reflection to less than 1%. The difference in the solar cells efficiency between with and without antireflection coating was 5.28%. The LBIC scan measurements may indicate a positive influence of the thin film Al 2 O 3 on the bulk passivation of the silicon.

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“…Dielectric transparent optical thin films in conventional optical filters select a spectral range of transmitted or reflected light such as anti reflecting coatings, pass band filters, athermal optical filters, edge filters, lenses etc., for several precision instruments (Spiller, 1984;Dobrowolski et al, 1996;Szeghalmi et al, 2009;Huber et al, 2014). Analogously, the rapidly developing advanced applications include narrow band filters for dense wavelength division multiplexing, low laser damage devices, optical elements for deep ultraviolet, and extreme ultraviolet lithography (Weber et al, 2012b), optical waveguides (slot waveguides, resonant waveguide structures, plasmonic structures, etc.)…”

Section: Introductionmentioning

confidence: 99%

Impact of Atomic Layer Deposition to Nanophotonic Structures and Devices

et al. 2014

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We review the significance of optical thin films by Atomic Layer Deposition (ALD) method to fabricate nanophotonic devices and structures. ALD is a versatile technique to deposit functional coatings on reactive surfaces with conformal growth of compound materials, precise thickness control capable of angstrom resolution, and coverage of high aspect ratio nano-structures using wide range of materials. ALD has explored great potential in the emerging fields of photonics, plasmonics, nano-biotechnology, and microelectronics. ALD technique uses sequential reactive chemical reactions to saturate a surface with a monolayer by pulsing of a first precursor (metal alkoxides or covalent halides), followed by reaction with second precursor molecules such as water to form the desired compound coatings. The targeted thickness of the desired compound material is controlled by the number of ALD-cycles of precursor molecules that ensures the self-limiting nature of reactions. The conformal growth and filling of TiO 2 and Al 2 O 3 optical materials on nanostructures and their resulting optical properties have been described. The low temperature ALD-growth on various replicated sub-wavelength polymeric gratings is discussed.

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Atomic layer deposition of Al_2O_3 and TiO_2 multilayers for applications as bandpass filters and antireflection coatings

Cited by 127 publications

References 14 publications

Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition

Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition

Silicon solar cells with Al2O3 antireflection coating

Impact of Atomic Layer Deposition to Nanophotonic Structures and Devices

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