Atomic layer deposition of aluminum oxide on hydrophobic and hydrophilic surfaces

Kobayashi, Nobuhiko P.; Donley, Carrie L.; Wang, Shih-Yuan; Williams, R. Stanley

doi:10.1016/j.jcrysgro.2006.11.224

Cited by 49 publications

(57 citation statements)

References 23 publications

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“…Furthermore, the particle-like ALD layers may have grown on the ridges of the membrane surface, which could then promote the surface roughness. Similar roughness increase has been also noticed when applying other type of ALD coatings [33]. …”

Section: Afm Characterisationsupporting

confidence: 80%

“…The AFM images of the coated membranes indicated a particle-like topography of ALD coating (Figure 3), which is typically obtained using low number of ALD cycles [14,33].…”

Section: Afm Characterisationmentioning

confidence: 95%

“…Indeed, the most hydrophilic membrane surface was obtained using 10 and 50 ALD cycles at 70 ºC or 10 ALD cycles at 100 ºC, having the water contact angles ~ 15 -30 o compared to 53 o for the uncoated membrane. This reduction in water contact angle can be attributed to the formation of a hydrophilic coating layer of Al 2 O 3 with some residues of Al-OH groups[33]. The membranes coated at 100 ºC were generally less hydrophilic compared to those coated at 70 ºC under otherwise identical conditions.…”

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confidence: 99%

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Surface modification of thin film composite polyamide membrane using atomic layer deposition method

Nikkola

Sievänen

Raulio

et al. 2014

Journal of Membrane Science

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Section: Afm Characterisationsupporting

confidence: 80%

“…The AFM images of the coated membranes indicated a particle-like topography of ALD coating (Figure 3), which is typically obtained using low number of ALD cycles [14,33].…”

Section: Afm Characterisationmentioning

confidence: 95%

mentioning

confidence: 99%

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Surface modification of thin film composite polyamide membrane using atomic layer deposition method

Nikkola

Sievänen

Raulio

et al. 2014

Journal of Membrane Science

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“…We suggest that the TiO 2 formed in the presence of Al 2 O 3 is more compact due to the more hydrophilic properties after ALD Al 2 O 3 (the existence of -OH units on the ALD Al 2 O 3 surface). TiO 2 of better quality is expected to be grown on the more hydrophilic surface during ALD in contrast to the NiO surface sensitized with an organic dye, 25 although the amorphous structure in both samples is confirmed by TEM. The shorter charge transport time in NiO-PB6-Al 2 O 3 -TiO 2 solar cell should be responsible for higher J sc and higher fill factor as compared to the NiO-PB6-TiO 2 solar cell.…”

Section: -9mentioning

confidence: 97%

Solid state p-type dye sensitized NiO–dye–TiO₂ core–shell solar cells

et al. 2018

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Solid state p-type dye sensitized NiO-dye-TiO 2 core-shell solar cells with an organic dye PB6 were successfully fabricated for the first time.With Al 2 O 3 as an inner barrier layer, the recombination process between injected holes in NiO and injected electrons in TiO 2 was significantly suppressed and the charge transport time was also improved.p-Type dye sensitized solar cells (p-DSCs) have attracted intense interest due to their different charge transfer kinetics with respect to more common studied n-DSCs, 1-3 and the potential application in tandem solar cells 4-6 and solar fuel devices. 7-9The conventional p-DSCs are based on liquid redox electrolytes. To avoid having a liquid phase in the p-DSCs, we have recently proposed and proven the concept of solid state p-DSCs, in which a solid state phenyl-C61-butyric acid methyl ester (PCBM) was used as an electron transport material (ETM) between the dye sensitized photocathode and the back contact. 10 Optimization of photosensitizer represents one strategy to improve the performance of this kind of solar cells. 11,12 Inspired by the conventional dye sensitized TiO 2 solar cells, we proposed that TiO 2 should be an alternative ETM to PCBM due to the fast electron injection from dyes into TiO 2 13,14 and good electron transport property. 15 Thus, we recently fabricated a dye sensitized NiOdye-TiO 2 core-shell film and, in contrast to previous work, [16][17][18] the nanoporous NiO film was first sensitized with the dye and a TiO 2 coating was applied afterwards. This dye sensitized coreshell film showed ultrafast hole (t 1/2 o 120 fs) and electron injection into NiO and TiO 2 respectively, resulting in ultrafast dye regeneration upon electron injection, t 1/2 r 500 fs. 19 In the present work, we proved that the dye sensitized NiO-dye-TiO 2 core-shell mesoporous film can be used for fabrication of solid state p-type dye sensitized solar cells. We also show the effect of an Al 2 O 3 inner barrier layer between NiO and TiO 2 on the performance of solar cell. Fig. 1 shows the configuration and working principle of the proposed p-type dye sensitized NiO-dye-TiO 2 core-shell solar cells. The donor-p-acceptor dye PB6 was utilized as photosensitizer since its reduction/oxidation potentials in excited state match with the valence band of NiO and conduction band of TiO 2 . 19The fabrication of the photoelectrode used in this study can be described briefly as follows. A compact NiO layer (60 nm) was sputtered onto a FTO substrate, then a mesoporous NiO layer (1.3 mm) was prepared by doctor-blading NiCl 2 gel on FTO glass and sintered at 450 1C for 0.5 h.20 Subsequently, the NiO electrode was immersed into 0.2 mM PB6 dichloromethane (DCM) solution overnight. The dye loading in the film was determined to be 31.6 nmol cm À2 by desorption experiment (see ESI †). After rinsing with methanol, the dye sensitized NiO film was dried and coated with metal oxides by atomic layer deposition (ALD). For NiO-PB6-TiO 2 photoelectrode, ca. 10 nm TiO 2 layer was coated directly on a dye sensit...

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“…Ultrasmooth Ag films with a grain size smaller than the electron mean free path in the bulk material (∼52 nm) would increase the collision rate and damping rate to enhance the optical loss, 25 which is a significant disadvantage for optical applications such as superlenses and hyperlenses. Chen et al 26 reported that postdeposition annealing treatment under optimized conditions can significantly reduce the optical loss to the value of bulk Ag while maintaining the ultrasmooth Ag film surface with the Ge nucleation layers. In this article, we have extended our previous study 21 to understand the physical and chemical roles played by a thin layer of Ge in establishing ultrasmooth Ag thin film deposition.…”

Section: ■ Introductionmentioning

confidence: 99%

Phenomenological Model of the Growth of Ultrasmooth Silver Thin Films Deposited with a Germanium Nucleation Layer

et al. 2015

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The structural properties of optically thin (15 nm) silver (Ag) films deposited on SiO2/Si(100) substrates with a germanium (Ge) nucleation layer were studied. The morphological and crystallographical characteristics of Ag thin films with different Ge nucleation layer thicknesses were assessed by cross-sectional transmission electron microscopy (XTEM), reflection high-energy electron diffraction (RHEED), X-ray diffractometry (XRD), grazing incidence X-ray diffractometry (GIXRD), X-ray reflection (XRR), and Fourier transform infrared spectroscopy (FTIR). The surface roughness of Ag thin films was found to decrease significantly by inserting a Ge nucleation layer with a thickness in the range of 1 to 2 nm (i.e., smoothing mode). However, as the Ge nucleation layer thickness increased beyond 2 nm, the surface roughness increased concomitantly (i.e., roughing mode). For the smoothing mode, the role of the Ge nucleation layer in the Ag film deposition is discussed by invoking the surface energy of Ge, the bond dissociation energy of Ag-Ge, and the deposition mechanisms of Ag thin films on a given characteristic Ge nucleation layer. Additionally, Ge island formation, the precipitation of Ge from Ag-Ge alloys, and the penetration of Ge into SiO2 are suggested for the roughing mode. This demonstration of ultrasmooth Ag thin films would offer an advantageous material platform with scalability for applications such as optics, plasmonics, and photonics.

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Atomic layer deposition of aluminum oxide on hydrophobic and hydrophilic surfaces

Cited by 49 publications

References 23 publications

Surface modification of thin film composite polyamide membrane using atomic layer deposition method

Surface modification of thin film composite polyamide membrane using atomic layer deposition method

Solid state p-type dye sensitized NiO–dye–TiO₂ core–shell solar cells

Phenomenological Model of the Growth of Ultrasmooth Silver Thin Films Deposited with a Germanium Nucleation Layer

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Atomic layer deposition of aluminum oxide on hydrophobic and hydrophilic surfaces

Cited by 49 publications

References 23 publications

Surface modification of thin film composite polyamide membrane using atomic layer deposition method

Surface modification of thin film composite polyamide membrane using atomic layer deposition method

Solid state p-type dye sensitized NiO–dye–TiO2 core–shell solar cells

Phenomenological Model of the Growth of Ultrasmooth Silver Thin Films Deposited with a Germanium Nucleation Layer

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Solid state p-type dye sensitized NiO–dye–TiO₂ core–shell solar cells