2009
DOI: 10.1002/smll.200900278
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Atomic Layer Deposition of Platinum Nanoparticles on Carbon Nanotubes for Application in Proton‐Exchange Membrane Fuel Cells

Abstract: Conformal deposition of Pt nanoparticles with good dispersion on carbon nanotubes (CNTs) is performed by atomic layer deposition (see image). The particle density and loading depend on surface condition and cycle number. The anode made of CNTs exhibits a higher catalytic efficiency than a commercial E‐TEK electrode, suggesting that it is a promising technique for application in proton‐exchange membrane fuel cells.

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Cited by 181 publications
(131 citation statements)
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“…This is surprising when considering that Pt ALD initiation on carbon nanotubes has been reported to be challenging. [37][38][39] However, EBID of Pt has been achieved on carbon nanotubes in several studies. 27,40 The microstructure of the EBID seed layer consisting of Pt grains embedded in amorphous carbon 41 most likely plays an important role in the nucleation of Pt ALD on the carbon nanotube.…”
mentioning
confidence: 99%
“…This is surprising when considering that Pt ALD initiation on carbon nanotubes has been reported to be challenging. [37][38][39] However, EBID of Pt has been achieved on carbon nanotubes in several studies. 27,40 The microstructure of the EBID seed layer consisting of Pt grains embedded in amorphous carbon 41 most likely plays an important role in the nucleation of Pt ALD on the carbon nanotube.…”
mentioning
confidence: 99%
“…Because of its high work function, platinum is also appropriate for use as a gate metal with high-κ dielectrics in metal-oxide-semiconductor field effect transistors (MOSFETs) [4,5]. Additionally, Pt is widely used in fuel cells due to its high catalytic activity [6,7]. Therefore, the combination of nanostructured semiconducting materials and metal nanotubes has the potential to produce novel multifunctional vertically-ordered three-dimensional nanodevices.…”
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confidence: 99%
“…In order to achieve a high deposition rate, a smooth surface topography and to minimize impurity content, a deposition temperature of 300 °C was determined to be optimum for the ALD process. The increase in growth rate at deposition temperatures higher than 320 °C is indicative of the decomposition of the Pt precursor [7]. Figure 1(a) shows a crosssectional transmission electron microscopy (TEM, XTEM, JEOL 2100F) analysis of the initial stage of ALD Pt deposition on planar Si substrates covered with native oxide.…”
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confidence: 99%
“…[25] Pt nanoparticle growth by ALD has in turn been explored for catalytic purposes. [26][27][28] The main problem of using ALD nanoparticle deposition to be employed in the field of plasmonics is a lack of easy to use processes for the most suitable metals in this field, that is, silver and gold. Only a single report exists on radical enhanced ALD of silver and even if the films had reasonably low resistivity of 6 mW cm, they contained quite substantial amounts of impurities.…”
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confidence: 99%