Atomic layer deposition of thermoelectric layered cobalt oxides

Hagen, Dirk J.; Karppinen, Maarit

doi:10.1116/6.0000166

Cited by 5 publications

(3 citation statements)

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“…Other thermoelectric materials are available to be deposit by ALD, the majority being the more traditional tellurium and bismuth compounds 117,118 in combination with antimony 119 and lead 120 while more novel materials started to be investigated recently e.g. cobalt oxides 121 . The ZnO chosen for this research has the advantage of the ease of deposition, ample research interest and ease of inorganic-organic integration to deposit the ZnO-HQ hybrid films…”

Section: Thermoelectric Ald/mld Zno-based Coatingsmentioning

confidence: 99%

Vacuum outgassing characteristics of unpigmented 3D printed polymers coated with atomic layer deposited alumina

Bihari

Heikkinen

Marín

et al. 2020

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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Publication I: Strongly reduced thermal conductivity in hybrid ZnO/nanocellulose thin films JH defined the research together with TT, EK and MK. MG participated in the sample preparation and structural characterization, together with JH and TT. Thermal conductivity measurements were performed by AG. The article was written by JH, TT, MK and EK, with critical review and inputs from all authors.Publication II: Flexible thermoelectric modules based on ALD grown ZnO on different substrates MG outlined the idea of the research in collaboration with TT and MK and carried out the fabrication and measurements of all the samples. MG wrote the manuscript in collaboration with the other authors.Publication III: Flexible thermoelectric module utilizing n-type ZnO and p-type PEDOT on textile substrates MG outlined the research with inputs from MK All the manufacture and measuring of the samples was done by MG that wrote the article with inputs and critical review from RF and MK.Publication IV: Atomic layer deposited aluminium oxide mitigates outgassing from fused filament fabrication-based 3-D printed components

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Section: Thermoelectric Ald/mld Zno-based Coatingsmentioning

confidence: 99%

Vacuum outgassing characteristics of unpigmented 3D printed polymers coated with atomic layer deposited alumina

Bihari

Heikkinen

Marín

et al. 2020

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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“…In this work, we approach this problem for the example of PtCoO 2 as for both Pt/PtO x and CoO x well-established ALD processes exist. [28,29,[47][48][49][50][51] We first investigate the ALD of PtCoO 2 thoroughly using Me 3 Pt(CpMe), Co-bis(N-t-butyl-N′ethylpropanimidamidate) (Co-AMD), and O 2 plasma, which is generated by a remote inductively-coupled-plasma (ICP) source. We have chosen these precursors because we used them in earlier work for the deposition of Pt, CoO x, and Co-P. [52] Next, we explore the formation of the delafossite phase by annealing in different atmospheres and analyze the crystal structure.…”

Section: Introductionmentioning

confidence: 99%

“…Atomic layer deposition (ALD) has been successfully implemented for the growth of a large number of ternary oxides. [27][28][29][30][31][32][33][34][35][36][37][38][39][40] For example, a review by Mackus et al [41] from 2019 provides an extensive overview of ALD processes for ternary and higher oxides, as well as doped oxides. Interestingly, the authors list only one ALD process for such an oxide that contains a…”

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confidence: 99%

Atomic Layer Deposition of the Conductive Delafossite PtCoO₂

Hagen

Yoon

Zhang

et al. 2022

Adv Materials Inter

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The first atomic layer deposition process for a ternary oxide is reported, which contains a metal of the platinum group, the delafossite PtCoO2. The deposition with the precursors trimethyl‐Pt‐methylcyclopentadienyl, Co‐bis(N‐t‐butyl‐N′‐ethylpropanimidamidate), and oxygen plasma results in a process with a nearly constant growth rate and stoichiometric composition over a wide temperature window from 100 to 320 °C. Annealing of the as‐deposited amorphous films in an oxygen atmosphere in a temperature window from 700 to 800 °C leads to the formation of the delafossite phase. Very thin films show a pronounced preferred orientation with the Pt sheets being almost parallel to the substrate surface while arbitrary orientation is observed for thicker films. The conformal coating of narrow trenches highlights the potential of this atomic‐layer‐deposition process. Moreover, heterostructures with magnetic films are fabricated to demonstrate the potential of PtCoO2 for spintronic applications.

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