Atomic layer deposition of transition metal films and nanostructures for electronic and catalytic applications

Abstract

Atomic Layer Deposition (ALD) has emerged as the technique of choice in the microelectronics industry, owing to its self-limiting nature, that allows conformal film deposition in highly confined spaces. However, while the ALD of metal oxide has developed dramatically over the past decade, ALD of pure metal, particularly the transition metals has been developing at a very slow pace. This article reviews the latest development in the ALD of pure transition metals and alloys, for electronic and catalytic applications. In particular, the article analyzes how different factors, such as the substrate properties, deposition conditions, precursor and co-reactant properties, influence the deposition of the metal films and nanostructures, as well as the emerging applications of the ALD derived transition metal nanostructures. The challenges facing the field are highlighted, and suggestions are made for future research directions.

Emerging Atomic Layer Deposition Technology toward High‐k Gate Dielectrics, Energy, and Photocatalysis Applications

“…Therefore, the ALD-based photocatalyst system is not only considered as an important candidate material in photocatalytic water treatment, [97,108] but also is expected to have huge development potential and space in the future in terms of photocatalytic air purification, [113,114] photocatalytic water decomposition for hydrogen production, [115,116] and provision of feasible ideas and solutions to solve environmental and energy problems. [52,117] In addition, some patents show that the inorganic material coated by ALD process is a photocatalytic porous film with conformal film, [118] and can also use ALD technology to coat the inner and outer surfaces of SiO 2 aerogel column with ultrathin TiO 2 coating for purifying toxic gases, [119] and prepare antimony oxychloride materials that can be used in the field of photocatalysis based on ALD technology. [120] ALD technology, due to its precise thickness control at the atomic level, has been able to successfully design the pore structure of membranes by increasing thickness and reducing pore size.…”

Engineering Schottky-like and heterojunction materials for enhanced photocatalysis performance – a review

“…25 Therefore, the Schottky like properties occurring at the metal/semiconductor interface further enhance the generation of reactive oxygen species (ROS), leading to an enhancement in the catalytic performance of the materials. 26,27…”

Nanometric 3D Printing of Functional Materials by Atomic Layer Deposition

“…Nanometric 3D Printing of Functional Materials by Atomic Layer Deposition DOI: http://dx.doi.org/10.5772/intechopen.101859 number of materials [2,15], such as oxides [59,60], metals [61], nitrides [62] and sulfides [63], the combination of this route with 3D printing can be beneficial to a myriad of applications.…”