Atomic Layer Deposition of WO3-Doped In2O3 for Reliable and Scalable BEOL-Compatible Transistors
Chanyoung Yoo,
Jonathan Hartanto,
Balreen Saini
et al.
Abstract:Tungsten oxide (WO 3 ) doped indium oxide (IWO) field-effect transistors (FET), synthesized using atomic layer deposition (ALD) for three-dimensional integration and back-end-of-line (BEOL) compatibility, are demonstrated. Low-concentration (1∼4 W atom %) WO 3 -doping in In 2 O 3 films is achieved by adjusting cycle ratios of the indium and tungsten precursors with the oxidant coreactant. Such doping suppresses oxygen deficiency from In 2 O 2.5 to In 2 O 3 stoichiometry with only 1 atom % W, allowing devices t… Show more
Silicon transistor miniaturization has hit a limit, constraining further semiconductor advancements. ALD-derived oxide semiconductors enable 3D vertical integration, providing a route to higher integration density without continued scaling down.
Silicon transistor miniaturization has hit a limit, constraining further semiconductor advancements. ALD-derived oxide semiconductors enable 3D vertical integration, providing a route to higher integration density without continued scaling down.
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