Atomic layer epitaxy of device quality AlGaAs and AlAs

Hayafuji, N.; Eldallal, Gamal M.; Dip, A.; Colter, P. C.; El‐Masry, N. A.; Bedair, S. M.

doi:10.1016/0169-4332(94)90189-9

Cited by 11 publications

(3 citation statements)

References 16 publications

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“…The first application was reported by the group of Bedair and coworkers in 1994. This ALD research, known as 'atomic layer epitaxy' (ALE) at that time, was on GaAs, AlGaAs and AlAs films used as absorbers in multijunction solar cells [4,5]. Reports on the application of ZnSe buffer layers for CIGS solar cells [6], and boron-doped ZnO films as transparent conductive oxide (TCO) deposited by ALD followed shortly afterwards [96][97][98][99][100] a Cu x S or CuInS 2 are infiltrated into TiO 2 pores, no exact thickness is specified.…”

Section: Introductionmentioning

confidence: 99%

Atomic layer deposition for photovoltaics: applications and prospects for solar cell manufacturing

Delft

Garcia-Alonso

Kessels

2012

Semicond. Sci. Technol.

194

132

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Atomic layer deposition (ALD) is a vapour-phase deposition technique capable of depositing high quality, uniform and conformal thin films at relatively low temperatures. These outstanding properties can be employed to face processing challenges for various types of next-generation solar cells; hence, ALD for photovoltaics (PV) has attracted great interest in academic and industrial research in recent years. In this review, the recent progress of ALD layers applied to various solar cell concepts and their future prospects are discussed. Crystalline silicon (c-Si), copper indium gallium selenide (CIGS) and dye-sensitized solar cells (DSSCs) benefit from the application of ALD surface passivation layers, buffer layers and barrier layers, respectively. ALD films are also excellent moisture permeation barriers that have been successfully used to encapsulate flexible CIGS and organic photovoltaic (OPV) cells. Furthermore, some emerging applications of the ALD method in solar cell research are reviewed. The potential of ALD for solar cells manufacturing is discussed, and the current status of high-throughput ALD equipment development is presented. ALD is on the verge of being introduced in the PV industry and it is expected that it will be part of the standard solar cell manufacturing equipment in the near future.

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Section: Introductionmentioning

confidence: 99%

Atomic layer deposition for photovoltaics: applications and prospects for solar cell manufacturing

Delft

Garcia-Alonso

Kessels

2012

Semicond. Sci. Technol.

194

132

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“…In what may have been the earliest application of ALD to solar cells, a series of papers in the early 1990s outlined the deposition of AlGaAs, AlAs, and GaAs as absorbers by ALD for tandem III-V solar cells where Si and C were used as the n-type and p-type dopants, respectively. [129][130][131][132] The reactor in these studies was a dual mode ALD and MOCVD chamber with trimethygallium, trimethylaluminum, and arsine as the reactant gases applied at deposition temperatures of 550-650 C. With a two junction device structure, efficiencies of almost 16% were achieved under concentrated light as shown in Fig. 16.…”

Section: Tandem Devices a Iii-v Multijunction Concentrator Devicesmentioning

confidence: 99%

Nanoengineering and interfacial engineering of photovoltaics by atomic layer deposition

et al. 2011

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Investment into photovoltaic (PV) research has accelerated over the past decade as concerns over energy security and carbon emissions have increased. The types of PV technology in which the research community is actively engaged are expanding as well. This review focuses on the burgeoning field of atomic layer deposition (ALD) for photovoltaics. ALD is a self-limiting thin film deposition technique that has demonstrated usefulness in virtually every sector of PV technology including silicon, thin film, tandem, organic, dye-sensitized, and next generation solar cells. Further, the specific applications are not limited. ALD films have been deposited on planar and nanostructured substrates and on inorganic and organic devices, and vary in thickness from a couple of angstroms to over 100 nm. The uses encompass absorber materials, buffer layers, passivating films, anti-recombination shells, and electrode modifiers. Within the last few years, the interest in ALD as a PV manufacturing technique has increased and the functions of ALD have expanded. ALD applications have yielded fundamental understanding of how devices operate and have led to increased efficiencies or to unique architectures for some technologies. This review also highlights new developments in high throughput ALD, which is necessary for commercialization. As the demands placed on materials for the next generation of PV become increasingly stringent, ALD will evolve into an even more important method for research and fabrication of solar cell devices.

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“…At that stage GaAs and AIGaAs films were deposited in the group of 8edair and co-workers for the application in multijunction (tandem) solar cells [4,5,6].…”

Section: Ald For Solar Cell Manufacturingmentioning

confidence: 99%

Atomic layer deposition: Prospects for solar cell manufacturing

Kessels

Hoex

Sanden

2008

2008 33rd IEEE Photovolatic Specialists Conference

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Atomic layer deposition (ALD) is a thin film growth technology that is capable of depositing uniform and con formal films on complex, three-dimensional objects with atomic precision. ALD is a rapidly growing field and it is currently at the verge of being introduced in the semicon ductor industry. Recently it has been recognized that the method has also applications in many other areas relying on thin films including the area of photovoltaics. In this contribution the basics and key features of the ALD method will be described focusing especially on the poten tial of the method in solar cell manufacturing. It will be shown that the method is of relevance for first, second and third generation solar cells.

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Atomic layer epitaxy of device quality AlGaAs and AlAs

Cited by 11 publications

References 16 publications

Atomic layer deposition for photovoltaics: applications and prospects for solar cell manufacturing

Atomic layer deposition for photovoltaics: applications and prospects for solar cell manufacturing

Nanoengineering and interfacial engineering of photovoltaics by atomic layer deposition

Atomic layer deposition: Prospects for solar cell manufacturing

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