Atomic-scale structural evolution of Ta–Ni–Si amorphous metal thin films

Oleksak, Richard P.; Devaraj, Arun; Herman, Gregory S.

doi:10.1016/j.matlet.2015.10.112

Cited by 8 publications

(2 citation statements)

References 21 publications

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“…Another significant contribution of APT has been in understanding crystallisation of amorphous metallic materials like bulk metallic glass or immiscible metal alloy systems [174][175][176][177][178][179]. Immiscible alloys, when subjected to heat treatments, can lead to devitrification to form nanocrystal precipitates in an amorphous matrix during the initial stage of annealing followed by a complete crystallisation.…”

Section: Applications Of Apt In Materials Analysismentioning

confidence: 99%

Three-dimensional nanoscale characterisation of materials by atom probe tomography

Devaraj

Perea

Liu

et al. 2017

International Materials Reviews

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139

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The development of three-dimensional (3-D), characterisation techniques with high spatial and mass resolution is crucial for understanding and developing advanced materials for many engineering applications as well as for understanding natural materials. In recent decades, atom probe tomography (APT), which combines a point projection microscope and time-offlight mass spectrometer, has evolved to be an excellent characterisation technique capable of providing 3-D nanoscale characterisation of materials with sub-nanometer scale spatial resolution, with equal sensitivity for all elements. This review discusses the current state, as of APT instrumentation, new developments in sample preparation methods, experimental procedures for different material classes, reconstruction of APT results, the current status of correlative microscopy, and application of APT for microstructural characterisation in established scientific areas like structural materials as well as new applications in semiconducting nanowires, semiconductor devices, battery materials, catalyst materials, geological materials, and biological materials. Finally, a brief perspective is given regarding the future of APT.

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Section: Applications Of Apt In Materials Analysismentioning

confidence: 99%

Three-dimensional nanoscale characterisation of materials by atom probe tomography

Devaraj

Perea

Liu

et al. 2017

International Materials Reviews

Self Cite

139

View full text Add to dashboard Cite

show abstract

“…Additionally, Al decreases the corrosion current density in Ta(Si 1-x Al x ) 2 coatings from 7.08 × 10 −6 to 3.05 × 10 −6 A•cm −2 [20]. Alloying of Ta-Si coatings by Zr and Ti improved the coatings' hardness (12)(13)(14)(15)(16) and corrosion resistance [21], whereas alloying by Ni produced amorphous coatings stable up to 900 • C for microelectronic applications [22]. Alloying by nitrogen and carbon is another promising avenue for enhancing the properties of TaSi 2 -based coatings.…”

Section: Introductionmentioning

confidence: 99%

Structure, Oxidation Resistance, Mechanical, and Tribological Properties of N- and C-Doped Ta-Zr-Si-B Hard Protective Coatings Obtained by Reactive D.C. Magnetron Sputtering of TaZrSiB Ceramic Cathode

Kiryukhantsev-Korneev

Сытченко

Vorotilo

et al. 2020

Coatings

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Coatings in the Ta-Zr-Si-B-C-N system were produced by magnetron sputtering of a TaSi2-Ta3B4-(Ta,Zr)B2 ceramic target in the Ar medium and Ar-N2 and Ar-C2H4 gas mixtures. The structure and composition of coatings were studied using scanning electron microscopy, glow discharge optical emission spectroscopy, energy-dispersion spectroscopy, and X-ray diffraction. Mechanical and tribological properties of coatings were determined using nanoindentation and pin-on-disk tests using 100Cr6 and Al2O3 balls. The oxidation resistance of coatings was evaluated by microscopy and X-ray diffraction after annealing in air at temperatures up to 1200 °C. The reactively-deposited coatings containing from 30% to 40% nitrogen or carbon have the highest hardness up to 29 GPa and elastic recovery up to 78%. Additionally, coatings with a high carbon content demonstrated a low coefficient of friction of 0.2 and no visible signs of wear when tested against 100Cr6 ball. All coatings except for the non-reactive ones can resist oxidation up to a temperature of 1200 °C thanks to the formation of a protective film based on Ta2O5 and SiO2 on their surface. Coatings deposited in Ar-N2 and Ar-C2H4 demonstrated superior resistance to thermal cycling in conditions 20-T−20 °C (where T = 200–1000 °C). The present article compares the structure and properties of reactive and “standard-inert atmosphere” deposited coatings to develop recommendations for optimizing the composition.

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Characterization of Ti-Cu Films Deposited by HPPMS and Effect on NO Catalytic Release and Platelet Adhesion Behavior

Chen

Cheng

Tai

et al. 2018

J. Wuhan Univ. Technol.-Mat. Sci. Edit.

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Atomic-scale structural evolution of Ta–Ni–Si amorphous metal thin films

Cited by 8 publications

References 21 publications

Three-dimensional nanoscale characterisation of materials by atom probe tomography

Three-dimensional nanoscale characterisation of materials by atom probe tomography

Structure, Oxidation Resistance, Mechanical, and Tribological Properties of N- and C-Doped Ta-Zr-Si-B Hard Protective Coatings Obtained by Reactive D.C. Magnetron Sputtering of TaZrSiB Ceramic Cathode

Characterization of Ti-Cu Films Deposited by HPPMS and Effect on NO Catalytic Release and Platelet Adhesion Behavior

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