Since the early 2000s, extensive research has been performed to
address numerous challenges in biochip and biosensor fabrication in
order to use them for various biomedical applications. These biochips
and biosensor devices either integrate biological elements (e.g.,
DNA, proteins or cells) in the fabrication processes or experience
post fabrication of biofunctionalization for different downstream
applications, including sensing, diagnostics, drug screening, and
therapy. Scalable lithographic techniques that are well established
in the semiconductor industry are now being harnessed for large-scale
production of such devices, with additional development to meet the
demand of precise deposition of various biological elements on device
substrates with retained biological activities and precisely specified
topography. In this review, the lithographic methods that are capable
of large-scale and mass fabrication of biochips and biosensors will
be discussed. In particular, those allowing patterning of large areas
from 10 cm
2
to m
2
, maintaining cost effectiveness,
high throughput (>100 cm
2
h
–1
), high
resolution (from micrometer down to nanometer scale), accuracy, and
reproducibility. This review will compare various fabrication technologies
and comment on their resolution limit and throughput, and how they
can be related to the device performance, including sensitivity, detection
limit, reproducibility, and robustness.