Automated Contacting of On-Wafer Devices for RF Testing

Mubarak, Faisal; Martino, Carmine De; Toskovic, R.; Rietveld, G.; Spirito, M.

doi:10.1109/cpem49742.2020.9191800

Cited by 6 publications

(1 citation statement)

References 5 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…In the effort to improve the contact repeatability, national metrology laboratories (NMIs) are well recognized to guaranty traceability of S-Parameters measurements [5]. Ongoing works are clearly oriented towards improving the probe to contact repeatability in the millimetre-wave (30 -300 GHz) up to the THz regime [11]- [12]. As mentioned in the introduction, we focus on the microwave regime (up to 67 GHz) with ultimate objective to address accurate measurements on extreme impedance devices.…”

Section: B Residual Calibration Error Termsmentioning

confidence: 99%

Impact of GSG Probe to Pads Contact Repeatability for On-Wafer RF Measurements

Mokhtari

Sebbache

Avramovic

et al. 2021

2021 IEEE 7th International Conference on Smart Instrumentation, Measurement and Applications (ICSIMA)

View full text Add to dashboard Cite

Improving the contact repeatability for on-wafer measurements is required to address accurate characterization of microwave and millimeter-wave extreme impedance devices foreseen in future RF semi-conductor industry. In this effort, residual error terms introduced by conventional on-wafer probe measurements are quantified in the frequency range 50 MHz -67 GHz. In particular, two sets of measurements considering movements of the probes in the Z-direction only and in X-Y-Z directions are considered. Controlling the probe in the XY axis showed better results in terms of repeatability, more than 10 times à 10 GHz and more than 5 times à 60 GHz. The residual error terms are propagated to determine the measurement uncertainty on the complex impedance of capacitances theoretically tested. Capacitance value of 1 fF measured at 10 GHz was measured with an error around 80 %. Moving the probe on the Z-direction only demonstrated that, if the X and Y movements of the probe are theoretically controlled, the error could be reduced to ~7%. In addition, preliminary design and fabrication of a new compact on-wafer probe station built up with nanorobotics is proposed. Both chuck and RF probes are equipped with nano-positioning stages operating in close loop operation.

show abstract

Section: B Residual Calibration Error Termsmentioning

confidence: 99%