2002
DOI: 10.1109/ted.2002.805570
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Avalanche multiplication and breakdown Al/sub x/Ga/sub 1-x/(x > 0.9)

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Cited by 17 publications
(16 citation statements)
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“…From our simulation it was found that in the Ge/Al x Ga 1−x As multilayer structures,β is significantly larger thanᾱ and theβ/ᾱ ratio increases with increasing Al content x as explicitly indicated in Table II. Theseβ/ᾱ ratios are larger than that in Ge and Al x Ga 1−x As [15], as well as those of other III-V materials.…”
Section: Resultsmentioning
confidence: 61%
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“…From our simulation it was found that in the Ge/Al x Ga 1−x As multilayer structures,β is significantly larger thanᾱ and theβ/ᾱ ratio increases with increasing Al content x as explicitly indicated in Table II. Theseβ/ᾱ ratios are larger than that in Ge and Al x Ga 1−x As [15], as well as those of other III-V materials.…”
Section: Resultsmentioning
confidence: 61%
“…6, determined from the MC simulation for a 2.5-μm-thick p-i-n, indicates that the breakdown characteristics of the Ge/Al x Ga 1−x As multilayer structures against the Al content x have similar trend as those in the Al x Ga 1−x As homojunctions. As pointed out in [15], the breakdown voltage V bd in Al x Ga 1−x As has a linear relationship up to x = 0.63, beyond which V bd has a shallower slope against x. This is because, the valley becomes less important in determining the V bd of Al x Ga 1−x As when Fig.…”
Section: Resultsmentioning
confidence: 83%
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“…4 and 5͒, and found that ␤ / ␣ improves when x increases from 0 to 0.6 but starts to show saturation from 0.6 to 0.8, since the electron ionization coefficient in Al 0.8 Ga 0.2 As is only marginally lower than that in Al 0.6 Ga 0.4 As. 10,11 On the other hand, it was found that when the i-region thickness increases to above 300 nm, ␤ / ␣ reduces toward an average characteristic between the Ge and Al x Ga 1−x As because the effects of dead space becoming less significant when the device length becomes thicker. 22 Thin i-region is also expected to give lower noise due to a narrower ionization probability distribution, 23 the GaAs/ Al x Ga 1−x As APD with similar device dimension has been studied and reported in the literature 5,23,24 and has been shown to exhibit low excess noise.…”
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confidence: 99%