AZO/Ag/AZO multilayer films prepared by DC magnetron sputtering for dye-sensitized solar cell application

Sutthana, Sutthipoj; Hongsith, Niyom; Choopun, Supab

doi:10.1016/j.cap.2009.09.020

Cited by 81 publications

(15 citation statements)

References 19 publications

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“…The resistivity of the trilayer film was much lower than that of the AZO single-layer film, and the transmittance of the trilayer film was much higher than that of the bilayer system. The figure of merit of the trilayer film is 1.94 9 10 À2 X À1 , much larger than another similar dielectric/metal/dielectric (D/M/D) structure, [25][26][27][28] indicating that the designed AZO/Al/AZO trilayer film has superior photoelectric performance.…”

Section: Resultsmentioning

confidence: 97%

Effect of Al Nanoparticles on the Microstructure, Electrical, and Optical Properties of AZO/Al/AZO Trilayer Thin Film

Lin

Tseng

2011

Journal of Elec Materi

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In this work, designed growth of aluminum (Al)/aluminum-doped zinc oxide (AZO), AZO/Al/AZO, and AZO/Al multilayer electrodes by radiofrequency (RF) magnetron sputtering on glass substrates was studied. The microstructures, optical properties, and electrical characteristics of the multilayer electrode thin films were analyzed, their structural denseness and thickness were observed by field-emission scanning electron microscopy (FE-SEM), and their crystal orientation was identified by x-ray diffraction (XRD). The resistivity and transmittance of the films were measured by four-point probe and UV-Vis-NIR spectrophotometer, respectively. The resistivity of the AZO/Al/AZO multilayer electrode thin film was 1.55 X cm. The average transmittance of the AZO/Al/ AZO thin film over wavelengths from 400 nm to 800 nm was much better than that of other thin films, since Al nanoparticles distribute in the AZO thin film during the sputtering process, as observed by high-resolution transmission electron microscopy (HRTEM). In addition, the figure of merit of the AZO/Al/ AZO trilayer film was much larger than those of the other structures.

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Section: Resultsmentioning

confidence: 97%

Effect of Al Nanoparticles on the Microstructure, Electrical, and Optical Properties of AZO/Al/AZO Trilayer Thin Film

Lin

Tseng

2011

Journal of Elec Materi

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“…Different structures have been proposed in the literature for improving the electrical performance of the front electrode, such as oxide/metal/oxide stacks [9][10][11][12][13], novel metal mesh substrate [14,15], laser-textured ITO films [16] and ITO/AZO bilayer films [17][18][19][20]. The oxide/metal/oxide stacks (e.g., AZO/Ag/AZO) were prepared by inserting a very thin metallic layer between the AZO layers.…”

Section: Introductionmentioning

confidence: 99%

Surface texturing studies of bilayer transparent conductive oxide (TCO) structures as front electrode for thin-film silicon solar cells

Yan

Aberle

et al. 2015

J Mater Sci: Mater Electron

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Surface textured transparent conductive oxide (TCO) thin films are widely used as the front electrode for thin-film silicon solar cells, as they can simultaneously provide good electrical conductance and optical management which improves the photon absorption via light scattering. In this paper, we report on bilayer TCO structures with enhanced electrical performance and good scattering properties. The bilayer TCO, made up of a highly conductive tin-doped indium oxide (ITO) layer and an etchable aluminium-doped (AZO) or intrinsic zinc oxide layer, are deposited onto soda-lime glass sheets via magnetron sputtering. The surface morphology of the ZnO films is subsequently modified using hydrochloric acid (HCl) etching. As for the bilayer TCO structure, the ITO mainly functions as the electrical layer and the surface textured ZnO acts as the optical layer for light scattering. Compared to single-layer AZO films, bilayer TCO films show different structural properties, which leads to disparate etching processes and thus different texturing properties.

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“…Yang et al [15,16] reported that the AZO/Cu/AZO OMO structures showed a figure of merit of 1.94 × 10 −2 Ω −1 for a Cu thickness of 8 nm with a resistivity of 7.92 × 10 −5 Ω-cm and an average transmittance of 84%. The tri-layered OMO structures were developed as the electrodes of the dye-sensitized solar cell (DSSC) application [19,20]. A DSSC primarily consists of a TCO layer, a working electrode, an electrolyte, and a counter electrode.…”

Section: Introductionmentioning

confidence: 99%

The structural and electro-optical characteristics of AZO/Cr:Cu/AZO transparent conductive film

2015

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AZO/Ag/AZO multilayer films prepared by DC magnetron sputtering for dye-sensitized solar cell application

Cited by 81 publications

References 19 publications

Effect of Al Nanoparticles on the Microstructure, Electrical, and Optical Properties of AZO/Al/AZO Trilayer Thin Film

Effect of Al Nanoparticles on the Microstructure, Electrical, and Optical Properties of AZO/Al/AZO Trilayer Thin Film

Surface texturing studies of bilayer transparent conductive oxide (TCO) structures as front electrode for thin-film silicon solar cells

The structural and electro-optical characteristics of AZO/Cr:Cu/AZO transparent conductive film

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