2018 IEEE 7th World Conference on Photovoltaic Energy Conversion (WCPEC) (A Joint Conference of 45th IEEE PVSC, 28th PVSEC &Amp 2018
DOI: 10.1109/pvsc.2018.8548280
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Back End Monolithic Serial Interconnection Technology for CIGS with Shunt-free Laser Scribing and Inkjet Printing

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Cited by 3 publications
(6 citation statements)
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“…The back‐end interconnection approach we have implemented for amorphous silicon thin film modules is also applicable for other thin film technologies like CIGS, cadmium‐telluride or perovskites. The approach has already been implemented for CIGS, 25,26 where a transparent conductor was used due to the substrate concept. Comparing our results with literature, the most obvious difference is the high fill factor of over 70% we achieved, whereas in literature values around 60% and well below are usually found 10,25–29 .…”
Section: Resultsmentioning
confidence: 99%
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“…The back‐end interconnection approach we have implemented for amorphous silicon thin film modules is also applicable for other thin film technologies like CIGS, cadmium‐telluride or perovskites. The approach has already been implemented for CIGS, 25,26 where a transparent conductor was used due to the substrate concept. Comparing our results with literature, the most obvious difference is the high fill factor of over 70% we achieved, whereas in literature values around 60% and well below are usually found 10,25–29 .…”
Section: Resultsmentioning
confidence: 99%
“…The approach has already been implemented for CIGS, 25,26 where a transparent conductor was used due to the substrate concept. Comparing our results with literature, the most obvious difference is the high fill factor of over 70% we achieved, whereas in literature values around 60% and well below are usually found 10,25–29 . Despite these results reported in literature, to our knowledge there is no production on industry level of customized modules regarding shape and colour and no post‐interconnection process after the deposition of all contact and active layers.…”
Section: Resultsmentioning
confidence: 99%
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“…A slight variation of the traditional interconnect of thin films is presented in [Gevaerts, 2018]. In this case, the aim is to separate the stack growth processes from the patterning ones as to optimize the latter without affecting the former.…”
Section: Alternative Architectures For Interconnection Of Cellsmentioning
confidence: 99%
“…In this case, the aim is to separate the stack growth processes from the patterning ones as to optimize the latter without affecting the former. As indicated in [Gevaerts, 2018], the cell is grown until the (undoped) intermediate ZnO layer; then, laser patterning of P1 is performed until Mo is removed and the trench is then filled with an insulator via inkjet printing. After this, the procedure continues as usual with the laser scribing of P2, then sputtering of TCO and finally removal of material in P3.…”
Section: Alternative Architectures For Interconnection Of Cellsmentioning
confidence: 99%