2018
DOI: 10.1103/physrevapplied.10.034069
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Balance of Horizontal and Vertical Charge Transport in Organic Field-Effect Transistors

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Cited by 29 publications
(44 citation statements)
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“…Hence, new device concepts need to be conceived which allow for an ultra‐short channel length in conjunction with low fabrication costs. In this regard, vertical organic transistors with a channel length of ≈100 nm have generated significant interest in recent years, as the vertical dimensions of an organic transistor can be easily controlled over the nanometer regime. The organic permeable base transistor (OPBT) is a truly vertical device with a semiconductor thickness in the order of 100 nm.…”
Section: Introductionmentioning
confidence: 99%
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“…Hence, new device concepts need to be conceived which allow for an ultra‐short channel length in conjunction with low fabrication costs. In this regard, vertical organic transistors with a channel length of ≈100 nm have generated significant interest in recent years, as the vertical dimensions of an organic transistor can be easily controlled over the nanometer regime. The organic permeable base transistor (OPBT) is a truly vertical device with a semiconductor thickness in the order of 100 nm.…”
Section: Introductionmentioning
confidence: 99%
“…In this regard, vertical organic transistors with a channel length of ≈100 nm have generated significant interest in recent years, [4][5][6][7][8][9][10] as the vertical dimensions of an organic transistor can be easily controlled over the nanometer regime. Hence, new device concepts need to be conceived which allow for an ultra-short channel length in conjunction with low fabrication costs.…”
mentioning
confidence: 99%
“…While Nakamura et al employed a shadow mask system for this patterning step resulting in an overlap of several micrometers, Kleemann et al developed several techniques over the years in order to bring this overlap down to the nanometer scale. Among these techniques are: lift‐off processes, complex dual‐step photolithography methods, and photolithography combined with wet‐etching . In particular, the development of a photolithographic process including wet‐etching resulted in an overlap of ≤50 nm which leads to an overall channel length of these pseudo‐VOFETs in the range of 100–200 nm.…”
Section: Overview Over Device Principles and State‐of‐the‐artmentioning
confidence: 99%
“…Additionally, they argued that the drain‐source voltage mainly drops across the contacts (including the resistance of the semiconducting film between the source electrode to the gate insulator) and hence the linear and saturation regimes are not expected to be observed for these devices. Later, Sawatzki et al developed a more detailed model for the transport in pseudo‐VOFETs by focusing on the role of the lateral overlap of the charge‐blocking‐layer over the source electrode and the influence of a different lateral and vertical charge carrier mobility . By means of a 2D drift‐diffusion model they analyzed the charge carrier distribution within the device in order to understand how the ratio of lateral and vertical transport governs the shape of the channel.…”
Section: Overview Over Device Principles and State‐of‐the‐artmentioning
confidence: 99%
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