2010
DOI: 10.1103/physrevb.82.085320
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Band alignment at a nonplanarSi/SiO2interface

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Cited by 37 publications
(48 citation statements)
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“…We attribute this effect to a negligible charge transfer between the Si core and the hydrogen terminating groups due to fairly close electronegativities of both elements (1.9 for Si, 2.2 for H, respectively) and negligible mechanical stress resulting from a small volume of the hydrogen terminating groups. (see Fig.9d), in good agreement with previous calculations [16,[18][19][20]. method, we can convert electronic states from real to reciprocal space to obtain the electronic band-like picture of a Si NC with a given diameter.…”
Section: Band Structure Of Bulk Silicon and Nanocrystalsupporting
confidence: 71%
See 1 more Smart Citation
“…We attribute this effect to a negligible charge transfer between the Si core and the hydrogen terminating groups due to fairly close electronegativities of both elements (1.9 for Si, 2.2 for H, respectively) and negligible mechanical stress resulting from a small volume of the hydrogen terminating groups. (see Fig.9d), in good agreement with previous calculations [16,[18][19][20]. method, we can convert electronic states from real to reciprocal space to obtain the electronic band-like picture of a Si NC with a given diameter.…”
Section: Band Structure Of Bulk Silicon and Nanocrystalsupporting
confidence: 71%
“…From the perspective of theoretical simulations, many approaches, ranging from ab initio [16][17][18][19][20] to parametrized semiempirical methods [12,[21][22][23] , have been adopted to investigate the optical and electronic properties of Si NCs. Ab initio methods provide a very accurate description of electronic states of fully relaxed Si NCs, but simulations of realistic systems with nanometer size are impossible due to excessive computational demand.…”
Section: Introductionmentioning
confidence: 99%
“…For example, Si NPs embedded in SiO 2 form a type I interface. [122][123][124] Recently, we showed that type-II interfaces may be realized by strain engineering when SiNPs are embedded in amorphous SiO 2 . 47 Using ab initio calculations, we showed that it is possible to design non-stoichiometric nanocomposites that exhibit a type-II hetero-junction at ambient conditions, unlike bulk crystalline Si and ZnS, 125 with complementary charge transport channels for electrons and holes.…”
Section: High Pressure Core Structuresmentioning
confidence: 99%
“…Note that our uncorrected band offset match that of other works investigating charge-carrier transport in Si-QDs by hopping mechanisms. 60,61 We have positioned the impurity atom in three different substitutional sites in the embedded system: at the QD center (in the following "dot"), at the QD/SiO 2 interface, and in the SiO 2 far away from the QD (in the following "silica"). The Si atoms at the interface can form three possible suboxide types, Si 1+ , Si 2+ , Si 3+ , depending on the number of bonded O atoms (in the following "int-1", "int-2", and "int-3").…”
Section: Structures and Methodsmentioning
confidence: 99%