2015
DOI: 10.1002/admi.201570020
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Band‐Gap Engineering: Band‐Gap Engineering at a Semiconductor–Crystalline Oxide Interface (Adv. Mater. Interfaces 4/2015)

Abstract: In article 1400497, J. H. Ngai and co‐workers demonstrate that the band offset between single crystalline SrZrxTi1−xO3 and Ge can be tuned through the Zr content, providing a pathway to control electrical coupling between multifunctional oxides and semiconductors.

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“…[40] Substitution of Zr ions for Ti has been shown to produce a wide, tunable range of band gaps by removing low lying Ti 3d states. [39] Using this approach, it may be possible to raise the bottom of the conduction band to reduce free carrier concentrations and control the absorption energies induced by Fe 2+ dopants.…”
Section: Discussionmentioning
confidence: 99%
“…[40] Substitution of Zr ions for Ti has been shown to produce a wide, tunable range of band gaps by removing low lying Ti 3d states. [39] Using this approach, it may be possible to raise the bottom of the conduction band to reduce free carrier concentrations and control the absorption energies induced by Fe 2+ dopants.…”
Section: Discussionmentioning
confidence: 99%
“…The creation of localized states through doping with nonisovalent ions has been shown to be an effective route in reducing the band gap but comes at the cost of a decrease of energy conversion efficiency through charge trapping. Alloying or codoping are alternative approaches that are generally less critical in terms of trap state creation but are more complex or limited to the specific material system. As band structures of oxide semiconductors are often particularly sensitive to changes in bond angles and bond length, strain has been suggested as a general means to tailor band alignments without the introduction of trap sites. Practically, strain in thin films is usually imposed by the heteroepitaxial growth on nonlattice-matched substrates.…”
mentioning
confidence: 99%