Published electron and hole drift-mobility measurements in hydrogenated amorphous silicon (a-Si:H), amorphous silicon alloys (a-SiGe:H and a-SiC:H), and microcrystalline silicon (µc-Si:H) are analysed in terms of the exponential bandtail trapping model. A three-parameter model was employed using an exponential bandtail width E, the band mobility µ 0 , and the attempt-toescape frequency ν. Low-temperature measurements indicate a value around µ 0 = 1 cm 2 V −1 s −1 for both the conduction and valence bands over the entire range of materials. High temperature-measurements for electrons in a-Si:H suggest a larger value of 7 cm 2 V −1 s −1 . These properties and those of the frequency ν are discussed as possible attributes of a mobility edge.