2000
DOI: 10.1116/1.591473
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Bandtails and defects in microcrystalline silicon (μc-Si:H)

Abstract: Articles you may be interested inDeep defects and their electron-capture cross sections in polymorphous silicon-germanium thin films J. Appl. Phys. 98, 033531 (2005); 10.1063/1.1999831 Defect density and recombination lifetime in microcrystalline silicon absorbers of highly efficient thin-film solar cells determined by numerical device simulations

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Cited by 28 publications
(21 citation statements)
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“…12 However, others have attributed the LESR signal to electrons trapped in the localized, conduction-band-tail states. [23][24][25] This attribution is supported by a study of the photoconductivity and the density of LESR states as functions of the generation rate. 24,25 These results can only be explained by means of localized carriers.…”
Section: -13mentioning
confidence: 88%
See 1 more Smart Citation
“…12 However, others have attributed the LESR signal to electrons trapped in the localized, conduction-band-tail states. [23][24][25] This attribution is supported by a study of the photoconductivity and the density of LESR states as functions of the generation rate. 24,25 These results can only be explained by means of localized carriers.…”
Section: -13mentioning
confidence: 88%
“…[23][24][25] This attribution is supported by a study of the photoconductivity and the density of LESR states as functions of the generation rate. 24,25 These results can only be explained by means of localized carriers. Moreover, the asymmetric line shape is not consistent with free electrons in the conduction band.…”
Section: -13mentioning
confidence: 92%
“…The assumption of these features is justified by various results in the literature. [17][18][19] We thus assume a mobility band gap with exponential band tails at the band edges and defects located between the band edges with distributions that can be described by Gaussians. We use a band gap value of 1.2 eV to describe both the intrinsic and doped nc-Si:H and vary the mobilities in a wide range to study their effect on PG, and later we fix the electron and hole mobilities to be 40 cm 2 / Vs and 4 cm 2 / Vs, respectively, for intrinsic ncSi:H. Properties of the doped layers and of the ITO and ZnO layers were also assumed to be homogeneous.…”
Section: Simulation Results: Sensitivity Studymentioning
confidence: 99%
“…exposed to a quasi-continuous microwave radiation and resonant changes of the sample current detected with standard lock-in techniques are indicative of the electronic activity of a defect. As shown in figure 2, EDMR revealed that tunnelling between shallow tail states of the conduction band (CE, Landé factor g = 1.998) and neutral dangling bonds (db 0 , g ≈ 2.005) exists in undoped µc-Si:H at T = 5K [12]. At higher T , the CE line disappears and the single db line remains.…”
Section: Introductionmentioning
confidence: 92%