2021
DOI: 10.1016/j.ifacol.2021.08.464
|View full text |Cite
|
Sign up to set email alerts
|

Bayesian optimization for Tuning Lithography Processes

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

0
1
0

Year Published

2023
2023
2023
2023

Publication Types

Select...
1

Relationship

0
1

Authors

Journals

citations
Cited by 1 publication
(1 citation statement)
references
References 3 publications
0
1
0
Order By: Relevance
“…The computer algorithms participating in this competition are Bayesian optimizations-a commonly used machine-learning method for expensive black-box functions [12][13][14] . This class of algorithms has been studied on other applications in the semiconductor industry [15][16][17] . Three diverse varieties of Bayesian optimizations were selected: (1) Algo1 using Markov chain Monte Carlo sampling 18 , a multivariate linear surrogate model to compensate for the high computation cost of the sampling, and an expected improvement (EI) function.…”
Section: Computer Algorithm Benchmarkingmentioning
confidence: 99%
“…The computer algorithms participating in this competition are Bayesian optimizations-a commonly used machine-learning method for expensive black-box functions [12][13][14] . This class of algorithms has been studied on other applications in the semiconductor industry [15][16][17] . Three diverse varieties of Bayesian optimizations were selected: (1) Algo1 using Markov chain Monte Carlo sampling 18 , a multivariate linear surrogate model to compensate for the high computation cost of the sampling, and an expected improvement (EI) function.…”
Section: Computer Algorithm Benchmarkingmentioning
confidence: 99%