1988
DOI: 10.5006/1.3583974
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Behavior of Selected Commercial Alloys during High Temperature Oxychloridation

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Cited by 22 publications
(19 citation statements)
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“…Two types of specimens were preoxidized, where one had a vapor deposited aluminium surface while the other specimens were untreated. A similar behavior was found by Eliott et al [25]. The results showed that at 2.6% chlorine in nitrogen aluminum oxide cannot offer any protection.…”
Section: 1 Aluminiumsupporting
confidence: 86%
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“…Two types of specimens were preoxidized, where one had a vapor deposited aluminium surface while the other specimens were untreated. A similar behavior was found by Eliott et al [25]. The results showed that at 2.6% chlorine in nitrogen aluminum oxide cannot offer any protection.…”
Section: 1 Aluminiumsupporting
confidence: 86%
“…At a temperature of 900 8C and an Ar-20%O 2 -2%Cl 2 gas mixture it was found that materials with high molybdenum content (Hastelloy X, S and C276) suffered from the evaporation of molybdenum oxychlorides. After increasing the temperature up to 1000 8C a complete disappearance of molybdenum and other refractory metals from the near surface regions could be found (even at molybdenum contents > 10%) [25]. After increasing the temperature up to 1000 8C a complete disappearance of molybdenum and other refractory metals from the near surface regions could be found (even at molybdenum contents > 10%) [25].…”
Section: Molybdenummentioning
confidence: 98%
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“…Scanning electron micrograph showing microstructure of oxide scale farmed on iron specimen exposed to Ar-15%O2-O.5%CI2 at 1100 K.of oxide f o r m a t i o n from a parabolic rate e q u a t i o n a n d to c h a n g e s in t h e relative t h i c k n e s s e s of t h e different layers of oxide in t h e scale with time(23)(24)(25)(26)(27).W h e n reaction[5] proceedsfrom left to right, t h e result is t h e f o r m a t i o n of a layer of metal oxide by chemical v a p o r deposition. Chemical v a p o r deposition processes can be characterized by t h e use of a d i m e n s i o n l e s s n u m b e r (the CVD n u m b e r ) , w h i c h e x p r e s s e s the ratio of t h e resistance to t h e deposition process due to diffusional t r a n s p o r t in t h e gas p h a s e to t h e resistance to t h e deposition process d u e to the kinetics of the chemical reaction at the surface of t h e deposit.…”
mentioning
confidence: 98%
“…When 5%H 2 O was introduced, the formation of internal Cr-rich oxides is probably related to the internal penetration of fluorine and oxygen. This internal penetration could also involve the fluorine-carbide reactions, leading to the formation of some new carbides in some places [18].…”
Section: Discussionmentioning
confidence: 99%