Bessy SX 700 UHV monochromator: Design features and kinematic concept

Riemer, Frank; Torge, R.

doi:10.1016/0167-5087(83)91141-9

Cited by 54 publications

(18 citation statements)

References 3 publications

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“…The deflection angle at the grating is selected by means of a plane mirror. The mirror is mounted in an SX700-geometry (Riemer and Torge, 1983) and selects the deflection angle according to the focusing condition for spherical gratings with fixed entrance and exit arm lengths. Gratings operating in outside diffraction order amplify the influence of surface errors of optical elements located in front of them onto the beamline performance.…”

Section: Monochromatormentioning

confidence: 99%

Cryo X-ray microscope with flat sample geometry for correlative fluorescence and nanoscale tomographic imaging

Schneider

Guttmann

Rehbein

et al. 2012

Journal of Structural Biology

112

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Section: Monochromatormentioning

confidence: 99%

Cryo X-ray microscope with flat sample geometry for correlative fluorescence and nanoscale tomographic imaging

Schneider

Guttmann

Rehbein

et al. 2012

Journal of Structural Biology

112

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“…Mirror M1 focusses the incident beam horizontally in front of the HiOS chamber and collimates vertically. As monochromator we use an existing SX-700 (PM-1 of BESSY-I) [31,32] equipped with two plane gratings and with a rotatable plane mirror M2. The monochromator operation in collimated light enables a very flexible operation at different c ff -values or on-blaze [30].…”

Section: General Layoutmentioning

confidence: 99%

An XUV optics beamline at BESSY II

et al. 2014

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The design for a new XUV-Optics Beamline is presented. The collimated plane grating monochromator (PGM-) beamline at a bending magnet is setup at the BESSY-II synchrotron radiation facility within the framework of the blazed-grating production facility. Coupled to a versatile four-circle (ten axes) UHV-reflectometer as a permanent end station the whole setup is dedicated to at-wavelength characterization and calibration of the in-house produced precision gratings and novel nano-optical devices as well as mirrors, multilayered systems etc. It is also open to external projects employing reflectometry, spectroscopy or scattering techniques. According to its purpose, this beamline has specific features, such as: very high spectral purity, provided by two independent high order suppression systems, an advanced aperture system for suppression of stray light and scattered radiation, a broad energy range between 10 eV and 2000 eV, small beam divergence and spot size on the sample. Thus this Optics Beamline will become a powerful metrology tool for reflectivity measurements in s-or p-polarisation geometry with linearly or elliptically polarized light on real optics up to 360 mm length and 4 kg weight.

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“…The grating chamber includes a plane mirror (M2) that rotates around an axis above the grating's rotation axis. This rotation also performs the translation required to illuminate the grating close to its pole [6]. The grating center is located at a distance of four meter downstream M1; its pole is 15 mm above the beam intercepting M2.…”

Section: Beamlinementioning

confidence: 99%