“…The lithographic methods should provide rapid, high-resolution patterning, with high throughput, maximal structure resolution, and an opportunity to control the created structure. , The use of thin polymer film instability represents an elegant way for polymer pattering, which satisfies the above-mentioned requirements. − The physical background of thin film instability and related polymer mass redistribution is typically explained within the framework of Marangoni flow, assuming that under the action of a surface tension gradient, a system tends to evolve toward a stable state by minimizing its surface area through the material flow. , The Marangoni-driven mass redistribution was successfully applied to create self-assembled polymer structures and the structures with arbitrary symmetry and, more recently, for the nanoscale removal of a protective thin film by resistive heating of carbon nanotubes. − Because the surface tension is a function of several parameters, the introduction of its gradient can be performed through several technological approaches, including the use of vertical or horizontal constant thermal treatment, transverse zone annealing, and so on. ,− …”