2019
DOI: 10.3390/coatings9090564
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Bifunctional TiO2/AlZr Thin Films on Steel Substrate Combining Corrosion Resistance and Photocatalytic Properties

Abstract: A novel multi-functional bilayer coating combining an anti-corrosion Al–Zr (4 at.% Zr) underlayer and an anti-biofouling TiO2 top layer was deposited on high-speed steel (HSS) substrates. Al–Zr (4 at.% Zr) film, deposited by DC magnetron sputtering, which is a single phased supersaturated solid solution of Zr in Al, is used to provide sacrificial corrosion resistance of steels and TiO2 is added as a top layer to induce photocatalytic activity and hydrophilic behavior which can generate antifouling properties i… Show more

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Cited by 10 publications
(12 citation statements)
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“…It has been previously proven that these microstructures are reached only when working with a very high precursor flow rate (3 mL•min −1 , meaning 0.027 mol•min −1 of TiO(acac) 2 ) in a narrow deposition temperature window, probably generating supersaturation CVD conditions [24]. The photocatalytic activity of these TiO 2 films was found to be very high, probably due to the high specific surface generated by the nanometric hierarchical flower-like structures [26]. The increase in titanium concentration in the solution (0.06 M) resulted in the increase in the microflowers' density.…”
Section: (A) Pure Tio 2 Layersmentioning
confidence: 99%
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“…It has been previously proven that these microstructures are reached only when working with a very high precursor flow rate (3 mL•min −1 , meaning 0.027 mol•min −1 of TiO(acac) 2 ) in a narrow deposition temperature window, probably generating supersaturation CVD conditions [24]. The photocatalytic activity of these TiO 2 films was found to be very high, probably due to the high specific surface generated by the nanometric hierarchical flower-like structures [26]. The increase in titanium concentration in the solution (0.06 M) resulted in the increase in the microflowers' density.…”
Section: (A) Pure Tio 2 Layersmentioning
confidence: 99%
“…The mixture was stirred until complete mixing at room temperature. The optimization of TiO 2 film deposition was already presented in [26]; we used the same deposition parameter as this study for TiO 2 and Cu-Ti-O films, mainly characterized by a deposition temperature of 550 • C for 40 min. A carrier gas flow of 6 L•min −1 and a solution feeding rate of 3 mL•min −1 were used.…”
Section: Film Growthmentioning
confidence: 99%
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