Big Red: A Development Environment for Bigraphs

Faithfull, Alexander; Perrone, Gian; Hildebrandt, Thomas

doi:10.14279/tuj.eceasst.61.835

Cited by 3 publications

(4 citation statements)

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“…Following techniques from software product line engineering, we present a framework to customize the graph-based representation to support a variety of applications. We implemented the approach as an extension of the Eclipse IDE integrating a bigraph modeling tool [10] with the Eclipse Modeling Framework [24], the de-facto reference implementation of EMOF.…”

Section: Contributionsmentioning

confidence: 99%

“…The variability framework presented in Section 5 can be implemented using available model transformation techniques. As a proof of concept, we implemented the approach as an extension of the Eclipse IDE integrating the bigraph modeling tool Big Red [10] with the Eclipse Modeling Framework [24], the de-facto reference implementation of OMG's EMOF standard.…”

Section: Tool Integration and Example Applicationmentioning

confidence: 99%

“…Several approaches utilizing bigraphs exist, focusing on different aspects. Visual design of bigraphical models has been considered [10], while facilities for simulation, verification and execution are provided by a plethora of approaches utilizing different forms of bigraphs and their dynamics. For example, DBtk [1] targets a form of bigraphs with directed edges; SBAM [14] extends bigraphs with stochastic semantics; finally, BigMC [21] performs model checking of matching properties.…”

Section: Introductionmentioning

confidence: 99%

“…In the following, we introduce a sample bigraph serving as running example. Consider an instance of a cyber-physical space that models a printing scenario, inspired by [10]; an office environment comprised of two rooms, where one contains a computer and a printer, while the other one contains a user who holds a print job. A user can submit the job for printing through the computer connected to the printer.…”

Section: The Idea Of Bigraphs: Informal Introduction and Visual Syntaxmentioning

confidence: 99%

See 3 more Smart Citations

An EMOF-Compliant Abstract Syntax for Bigraphs

Kehrer

Tsigkanos

Ghezzi

2016

Electron. Proc. Theor. Comput. Sci.

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Bigraphs are an emerging modeling formalism for structures in ubiquitous computing. Besides an algebraic notation, which can be adopted to provide an algebraic syntax for bigraphs, the bigraphical theory introduces a visual concrete syntax which is intuitive and unambiguous at the same time; the standard visual notation can be customized and thus tailored to domain-specific requirements. However, in contrast to modeling standards based on the Meta-Object Facility (MOF) and domain-specific languages typically used in model-driven engineering (MDE), the bigraphical theory lacks a precise definition of an abstract syntax for bigraphical modeling languages. As a consequence, available modeling and analysis tools use proprietary formats for representing bigraphs internally and persistently, which hampers the exchange of models across tool boundaries. Moreover, tools can be hardly integrated with standard MDE technologies in order to build sophisticated tool chains and modeling environments, as required for systematic engineering of large systems or fostering experimental work to evaluate the bigraphical theory in real-world applications. To overcome this situation, we propose an abstract syntax for bigraphs which is compliant to the Essential MOF (EMOF) standard defined by the Object Management Group (OMG). We use typed graphs as a formal underpinning of EMOF-based models and present a canonical mapping which maps bigraphs to typed graphs in a natural way. We also discuss application-specific variation points in the graph-based representation of bigraphs. Following standard techniques from software product line engineering, we present a framework to customize the graph-based representation to support a variety of application scenarios.

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Section: Contributionsmentioning

confidence: 99%

Section: Tool Integration and Example Applicationmentioning

confidence: 99%