Bilateral comparison of power measurement standards for KrF excimer lasers between PTB and NIST

Kück, S.; Brandt, Friedhelm; Dowell, Marla L.; Cromer, Christopher L.; Keenan, Darryl A.

doi:10.1007/s12647-010-0007-9

Cited by 3 publications

(2 citation statements)

References 9 publications

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“…NIST currently supports IR calibrations, but not at the power and pulse conditions necessary for commercial EUVL [39]. And although NIST currently offers calibrations to the microfabrication industry targeted for lithography, it is only at 193 nm and 248 nm wavelengths [40][41][42][43]. Calibrations in the EUV wavelength regime are possible, but only at significantly lower powers (milliwatts) than EUVL tools produce [44].…”

Section: Radiometry For Euv Generationmentioning

confidence: 99%

Report from the Extreme Ultraviolet (EUV) Lithography Working Group Meeting :

Rasmussen

2023

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This is the report of a hybrid working group meeting held on April 25, 2023, at the National Institute of Standards and Technology (NIST) in Boulder, CO. The working group was focused on extreme ultraviolet lithography (EUVL) research, development, and manufacturing. The meeting allowed for productive discussions on many technical aspects of EUVL. Industry participants gave presentations that helped inform this report's outline of the current state of the science, challenges, needs, and future opportunities for accelerated innovation in EUVL. The report also includes information on some of NIST's efforts that could begin or continue to support the USA semiconductor industry. Cohesively presenting some of NIST's research and capabilities at the working group meeting provided external stakeholders visibility and the opportunity to comment. The meeting was insightful for industry participants learning about NIST's research capabilities .In turn, NIST researchers gained a deeper understanding of the industry's needs to identify where NIST's metrology expertise could assist in EUVL research. The meeting and this report do not, and are not intended to, capture the entire perspective of the EUVL industry but rather serve as a discussion starting point. Future work includes expanding participation, honing NIST research sub-groups to specific needs of EUVL, and executing priority research discussed in the working group meeting or any future meetings. Through engagement with the USA EUVL industry, targeted research collaborations are hoped to be created, accelerating semiconductor manufacturing innovation and generating meaningful value for USA taxpayers.

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Section: Radiometry For Euv Generationmentioning

confidence: 99%

Report from the Extreme Ultraviolet (EUV) Lithography Working Group Meeting :

Rasmussen

2023

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“…High-energy laser energy meters are calibrated mainly via two methods: (1) optical element spectrometry accompanied with a standard energy meter [1,2], and (2) replacement of laser energy by electric energy and transforming electric energy to heat energy by wrapping heating wire on the absorber or installing a high-power halogen tungsten lamp in the absorber [3][4][5][6][7][8]. The first method is simple but necessitates a laser source and a standard high-power energy meter, but these two devices in the high-power and high-energy field are rare at present.…”

Section: Introductionmentioning

confidence: 99%

Technology for radiation efficiency measurement of high-power halogen tungsten lamp used in calibration of high-energy laser energy meter

Sun

et al. 2015

Appl. Opt.

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The calibration method using a high-power halogen tungsten lamp as a calibration source has many advantages such as strong equivalence and high power, so it is very fit for the calibration of high-energy laser energy meters. However, high-power halogen tungsten lamps after power-off still reserve much residual energy and continually radiate energy, which is difficult to be measured. Two measuring systems were found to solve the problems. One system is composed of an integrating sphere and two optical spectrometers, which can accurately characterize the radiative spectra and power-time variation of the halogen tungsten lamp. This measuring system was then calibrated using a normal halogen tungsten lamp made of the same material as the high-power halogen tungsten lamp. In this way, the radiation efficiency of the halogen tungsten lamp after power-off can be quantitatively measured. In the other measuring system, a wide-spectrum power meter was installed far away from the halogen tungsten lamp; thus, the lamp can be regarded as a point light source. The radiation efficiency of residual energy from the halogen tungsten lamp was computed on the basis of geometrical relations. The results show that the halogen tungsten lamp's radiation efficiency was improved with power-on time but did not change under constant power-on time/energy. All the tested halogen tungsten lamps reached 89.3% of radiation efficiency at 50 s after power-on. After power-off, the residual energy in the halogen tungsten lamp gradually dropped to less than 10% of the initial radiation power, and the radiation efficiency changed with time. The final total radiation energy was decided by the halogen tungsten lamp's radiation efficiency, the radiation efficiency of residual energy, and the total power consumption. The measuring uncertainty of total radiation energy was 2.4% (here, the confidence factor is two).

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Radiative characteristics of high-power halogen tungsten lamp used in calibration of high-energy laser energy meter

Chang

Sun

et al. 2015

SPIE Proceedings

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Bilateral comparison of power measurement standards for KrF excimer lasers between PTB and NIST

Cited by 3 publications

References 9 publications

Report from the Extreme Ultraviolet (EUV) Lithography Working Group Meeting :

Report from the Extreme Ultraviolet (EUV) Lithography Working Group Meeting :

Technology for radiation efficiency measurement of high-power halogen tungsten lamp used in calibration of high-energy laser energy meter

Radiative characteristics of high-power halogen tungsten lamp used in calibration of high-energy laser energy meter

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