Biomimetic Micropatterning of Titanium Dioxide Thin Films for Gate Dielectrics

Self-assembled monolayers and titanium dioxide: From surface patterning to potential applications

“…In that respect, it is interesting to mention that the dielectric constant of amorphous TiO 2 grown on patterned OTS from titanic acid (H 2 TiO 3 ) [92] was estimated to be 63 at 100 kHz, significantly larger than the reported values of 22 measured for biomimetically deposited amorphous TiO 2 [93]. This was attributed to the existence of small crystallized particles.…”

“…The large dielectric constant k of TiO 2 (25 < k < 30) compared with that of silica ( k = 3.9), as well as its refractory properties, suggest its use in MOSFET technology [ 91 ]. In that respect, it is interesting to mention that the dielectric constant of amorphous TiO 2 grown on patterned OTS from titanic acid (H 2 TiO 3 ) [ 92 ] was estimated to be 63 at 100 kHz, significantly larger than the reported values of 22 measured for biomimetically deposited amorphous TiO 2 [ 93 ]. This was attributed to the existence of small crystallized particles.…”

Microstructure-Controlled Deposition of SrTiO3 Thin Film on Self-Assembled Monolayers in an Aqueous Solution of (NH4)2TiF6−Sr(NO3)2−H3BO3

“…Self-assembled monolayers (SAMs) have been employed to tailor morphology of thin films − or to control crystal nucleation . SAMs are highly ordered and oriented molecular assemblies formed by the chemisorption of an active surfactant on a solid surface.…”

“…The functional groups of SAMs themselves can be modified by different techniques such as X-ray, electron beam, 16a, ion bombardment and UV irradiation. , Therefore, a variety of surfaces with specific interactions can be produced with fine chemical control, enabling control of film formation and manipulation of morphology. We found that thin films can be selectively produced on the hydrophilic surfaces of silanol regions that were prepared by UV irradiation of SAMs; films in these regions were uniform and showed strong adherence to the substrates. − ,− However, a hydrophobic SAM surface such as octadecyl-trichloro-silane (OTS) dramatically suppressed film formation. It is possible that no deposit is formed in the very beginning stage of soaking before a dense film is generated on the silanol region. ,,− In some cases, deposition occurred on both hydrophilic and hydrophobic regions, but the film on the latter surfaces was too weak to be easily peeled off by ultrasonication .…”

Graded-permittivity polymer nanocomposites as superior dielectrics

“…The Rietveld quantitative phase analysis (Figure 2) performed on Fe3O4@TiO2 NP before and after calcination evidenced how this step induced a partial crystallization of the TiO2 phase, which went from being completely amorphous to exhibiting ≈35 wt% of anatase (Table 1). Based on the results of this analysis, the dielectric constant r of the Fe3O4@TiO2 NP before and after the calcination step was estimated to be equal to 21 and 31, respectively, 7 using a rule-of-mixture [13] (with εanatase=50 [13], εamorphous=15 and εmagnetite=10 [14] where εamorphous was calculated by averaging the values of the dielectric constant for amorphous TiO2, assumed to be equal to 20 [15] and for amorphous Fe3O4, assumed to be equal to 10 [14]). In light of the results of the magnetic and diffractometric analyses, the execution of a calcination step at 450°C for 6 hours was considered a good compromise between the reduction in magnetization and the increment in permittivity.…”