1970
DOI: 10.1021/ma60013a001
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Block Copolymers of Polydimethylsiloxane and Polystyrene

Abstract: The title copolymers are prepared essentially free of the parent homopolymers by polymerizing hexamethylcyclotrisiloxane with "living" polystyrene prepared from an alkyllithium. The siloxane polymerization generates poly(styrene-b-dimethylsiloxane) without the complications of chain scission and oligomerization usually encountered in anionic polymerization of cyclosiloxanes. The AB block copolymers resemble surfactants due to the extreme differences in solubility between the two blocks. Films of the block copo… Show more

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Cited by 137 publications
(68 citation statements)
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“…20,27,28 In the following discussion, different thermal annealing is used to study the thermal equilibrium of the surface morphology of the PS-b-PDMS copolymer thin films.…”
Section: Morphology Of the Annealed Filmsmentioning
confidence: 99%
“…20,27,28 In the following discussion, different thermal annealing is used to study the thermal equilibrium of the surface morphology of the PS-b-PDMS copolymer thin films.…”
Section: Morphology Of the Annealed Filmsmentioning
confidence: 99%
“…The fact that block copolymers of polystyrene and poly(dimethylsiloxane) had already been characterised (89)(90)(91), encouraged a preliminary study (88) of the feasibility of studying the statistical conformations of polystyrene chains by using labile dimethylsfloxane linkages to effect ring-chain equilibration reactions. Block copolymers with the structures poly(dimethylsiloxane) poly-b.styrene.b-poly(dimethylsiloxane) were prepared from styrene and hexamethylcyclotrisiloxane by the methods of Wenger (92) and Morton and his co-workers (93).…”
Section: B Polymeric Paraffin-siloxanes (83)mentioning
confidence: 99%
“…Block copolymers containing PDMS segments may be synthesized by techniques such as anionic polymerization [7][8][9] , atom transfer radical polymerization 10,11 , and reversible addition-fragmentation chain transfer polymerization 12 .…”
Section: Introductionmentioning
confidence: 99%