The
fabrication of electronic, photonic, and metamaterial-based
devices, or tissue engineering requires the controlled deposition
and patterning of materials. Electron-beam lithography (EBL) offers
unprecedented miniaturization of those devices because of its high
resolution. We present a concept to induce a classic photochemical
reaction in condensed matter via EBL. We investigate the response
of a tetrameric cinnamate monomer in thin films toward photon and
electron radiation. In the solid state, photoexcitation and electron
bombardment similarly induce [2 + 2] cycloadditions, forming insoluble
truxilic acid esters, as shown via IR spectroscopy measurements. Subsequently,
we employed the investigated material as an electron-beam resist,
showing resistance against wet-chemical etchants. Structures with
resolution down to 60 nm were obtained, not achievable with conventional
photolithography, proving that [2 + 2] cycloaddition of cinnamic acid
containing compounds is suitable for applications in the field of
EBL.