Boron-doped amorphous carbon was synthesized by polymerizing naphthalene and triphenylborane with subsequent heat treatment by spark plasma sintering. The boron-doped carbon material has negative Seebeck coefficient (¹0.22 mV K ¹1 ), which indicates the carbon material functions as an n-type semiconductor.The allotropes of carbon materials such as graphene, fullerenes, and carbon nanotubes have attracted increasing attention due to their novel physical and unusual electronic properties. These graphitic materials, which consist of sp 2 hybridized carbons, have been employed as field effect transistors, field emission electrodes, and solar cells.1 On the other hand, thin films of amorphous carbon (a-C) that contain mixed configurations of threefold (sp 2 ) and fourfold (sp 3 ) coordinate sites have a number of useful properties, such as high dielectric strength, chemical stability, 2,3 and a tunable band gap by adjusting the sp 2 and sp 3 bond ratios. Applications of a-C in the field of semiconductors are wide. 4 In order to modify the electronic properties of a-C, heteroatoms such as N and B are often used as dopants, producing n-type and p-type semiconductor behavior, respectively.
5,6Organic boron compounds are more stable and less toxic than B-source materials such as diborane or boron chloride and are expected to be efficiently incorporated into carbon frameworks. In this study, B-doped a-C semiconducting materials that exhibit an n-type semiconducting behavior were prepared using an organic boron compound.B-doped a-C materials were synthesized by polymerizing naphthalene and triphenylborane in the presence of AlCl 3 , followed by heating the resulting carbon precursor by spark plasma sintering (SPS). Synthesis involved the following twostep procedure: 7.5 g of naphthalene, 0.78 (0.5 atom % B-doped sample) or 1.96 g (1.0 atom % B-doped sample) of triphenylborane, and 4.0 g of AlCl 3 were mixed and heated at 673 K for 50 h under nitrogen gas flow. The obtained carbon precursor (powder) was washed repeatedly with ethanol and tetrahydrofuran to remove residual AlCl 3 . The resulting carbon precursors were pressed under 50 MPa in a spark plasma sintering apparatus (SPS515S, SPS Syntex Inc.). The samples were heated to 873 K at 100 K min ¹1 and held for 10 min to produce sample pellets (diameter: 15 mm, thickness: 2 mm). Figure 1A shows Raman spectra of the nondoped and Bdoped a-C materials. The peaks observed at 1580 and 1350 cm ¹1 are attributed to the G (stretching mode of graphite) and D (breathing mode) bands, respectively. There is no difference in the ratio of the G to D band intensities between the samples with and without B, and the average size of graphene was estimated to be 1.2 nm.3 The Raman spectra in Figure 1A also have shoulder peaks at around 1220 and 1440 cm ¹1 that are assignable to the symmetric vibrational mode of CC bonds in finite domain size polycyclic aromatic hydrocarbons (PAHs). 7 This indicates that these a-C materials consist of a mixed structure of small carbon sheets and PAHs. Figure...