Borophosphosilicate glass films in silicon microelectronics, part 2: Structure and applications

Vasil'ev, V. Yu.

doi:10.1007/s11180-005-0020-9

Cited by 3 publications

(2 citation statements)

References 11 publications

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“…Thus, obtained BPSG films are less reactive with moisture and have a high density. These are characteristic features of type II films, which have a dense structure and homogenous distribution of boron and phosphorus oxides [29]. Fig.…”

Section: Materials Of Electronicsmentioning

confidence: 96%

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Deposition of borophosphosilicate glass films using the TEOS–dimethylphosphite–trimethylborate system

Turtsevich

Nalivaiko

2015

ТКЭА

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Modernization of horizontal low pressure deposition system has been performed. The liquid source delivery system using the bubblers has been developed. The PSG and BPSG film deposition processes and film properties using TEOS-Dimethylphosphite-TEB system have been studied. It is shown that the use of dimethylphosphite allows varying the phosphorus concentration in the wide range. It is found that the optimal range of the total boron and phosphorus concentration ensuring the acceptable topology planarity and resistance to defect formation during storage is 8.7±0.3 wt% when the phosphorus concentration is 3.0—3.8 wt%. It is found that at use of the TEOS-DMP-TEB system the depletion of the phosphorus concentration along reaction zone does not occur, and the total dopant concentration is practically constant. At the same time the deposition rate of BPSG films is 9.0—10.0 nm/min and the good film thickness uniformity are ensured. The as-deposited films have “mirror-like surface” that is proof of minimal surface roughness. The BPSG films with optimal composition are characterized by the reduced reaction capability against atmospheric moisture.

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Section: Materials Of Electronicsmentioning

confidence: 96%

“…In situ thermal reflow was also employed in the present study and it as well allowed to obtain BPSG films that were immune to defect forma- ♦ -defect limit [29]; -defect limit [this study]; ▲ -optimum range [29]; × -optimum range [this study] …”

Section: Materials Of Electronicsmentioning

confidence: 99%

Deposition of borophosphosilicate glass films using the TEOS–dimethylphosphite–trimethylborate system

Turtsevich

Nalivaiko

2015

ТКЭА

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Development of glass-ceramics from boron containing waste and meat bone ash combinations with addition of waste glass

Çiçek

Tucci

Bernardo

et al. 2014

Ceramics International

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Optical Band Gap, Oxidation Polarizability, Optical Basicity and Electronegativity Measurements of Silicate Glasses Using Ellipsometer and Abbe Refractometer

Hussain¹

2021

NJGC

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The values of refractive index (n) for silicate glasses (silica, soda lime and borosilicate 7059) are decreased from 1.5119 to 1.5111, 1.5086 to 1.5065 and 1.5296 to 1.5281, respectively; and the optical band gap (E g ) is increased from 9.8 to 9.81 eV, 9.845 to 9.88 eV and 9.56 to 9.58 eV, respectively over the temperature range 295 -473 K using ellipsometer at wavelength 632.8 nm.While n is decreased from 1.5276 to 1.5274, 1.5074 to 1.5070 and from 1.5283 to 1.5281, respectively; and E g is increased from 9.59 to 9.592 eV, 9.862 to 9.870 eV, and 9.574 to 9.58 eV, respectively over the temperature range 297 -322 K using Abbe refractometer at wavelength 589.3 nm. The values of oxide ion polarizability [α o2-(n) and α o2-(E g )] regarding silica, soda lime and borosilicate 7059 glasses are decreased from 1.3427 to 1.3408, 1.6014 to 1.5941, 1.4329 to 1.4193, respectively over the temperature range 295 -473 K using ellipsometer; and are decreased from 1.3786 to 1.3764, 1.5991 to 1.5969, 1.4297 to 1.4191, respectively over the temperature range 297 -322 K using Abbe refractometer. Similarly, the values of optical basicity [A (n) and A (E g )] of silica, soda lime, and borosilicate 7059 glasses are decreased from 0.4272 to 0.4245, 0.6271 to 0.6224, 0.5045 to 0.4933, respectively over the temperature range 295 -473 K using ellipsometer; and are decreased from 0.4586 to 0.4567, 0.6256 to 0.6242, 0.5018 to 0.4930, respectively over the temperature range 297 -322 K using Abbe refractometer. Further, we have found that for silica, soda lime and borosilicate 7059, the values of electronegativity (ξ 1av )ζ 1 ) using Zahid numerical model [based on α O2-(n) and A (n)] are increased from 5.1035 to 5.5504, 4.0393 to 4.830, 4.8143 to 5.0111, respectively over the temperature range 295 -473 K using ellipsometer; while these values are increased from 5.

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Borophosphosilicate glass films in silicon microelectronics, part 2: Structure and applications

Cited by 3 publications

References 11 publications

Deposition of borophosphosilicate glass films using the TEOS–dimethylphosphite–trimethylborate system

Deposition of borophosphosilicate glass films using the TEOS–dimethylphosphite–trimethylborate system

Development of glass-ceramics from boron containing waste and meat bone ash combinations with addition of waste glass

Optical Band Gap, Oxidation Polarizability, Optical Basicity and Electronegativity Measurements of Silicate Glasses Using Ellipsometer and Abbe Refractometer

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