Efficient electroluminescence with power efficiency up to 0.12% is observed from silicon pn diodes prepared by boron implantation with boron concentrations above the solubility limit at the postimplantation annealing temperature. The electroluminescence spectra exhibit a transition from two bound-exciton bands towards the free electron-hole pair recombination with an anomalous increase in the total intensity with increasing temperature. The implantation dose and temperature dependences of the relative peak intensities provide evidence for the relevance of excitonic traps as a supply for free electron-hole pairs and thus for the origin of the enhanced electroluminescence at elevated temperatures. © 2003 American Institute of Physics. ͓DOI: 10.1063/1.1626809͔The implementation of silicon-based optoelectronics requires the realization of light emitters, waveguides, and photodiodes compatible with standard silicon processing technology. 1 Light emitters, such as silicon nanoclusters, Erdoped Si-rich SiO 2 , SiGe quantum dots, and silicon pn junctions are presently considered as potential light sources. 2 The latter ones are especially attractive, since they are fully compatible with silicon ultralarge-scale integration technology including low operation voltages. Although bulk silicon, being an indirect semiconductor with inefficient radiative recombination, has been neglected for this purpose for a long time, significant improvements in the electroluminescence ͑EL͒ efficiency from bulk silicon pn diodes have been reported recently. 3,4 The main concept for improving the light emission from silicon is based on a decrease of nonradiative decay channels possibly with carrier confinement in the active region of the device. Green et al. 3 employed surface texturing in combination with efficient surface passivation of high-purity float-zone silicon to improve the light extraction from the pn junction. Ng et al. 4 prepared silicon lightemitting diodes by high boron-dose implantation for the p-type doping in silicon pn junctions. They explained the increased EL efficiency by carrier confinement introduced by dislocation loops formed during implantation, where the strain-induced potential at dislocations loops prevents carriers from diffusing to nonradiative channels, thus leading to a strong band edge electron-hole recombination. Similar high EL efficiency was also reported in silicon p ϩ n junctions prepared by thermal diffusion of high boron concentrations (3 ϫ10 19 cm Ϫ3 ) in the surface layer. 5 All these pn diodes with highly boron-doped surface layers have in common the interesting feature of an anomalous increase in EL efficiency with temperature, which is in stark contrast to the conventional behavior of photoluminescence from bulk silicon. A study of this anomalous temperature dependence is essential for the understanding of the enhancement of the EL with increased boron doses. However, up to now no detailed experimental investigation has been reported for clarifying the origin of the anomalous temperature depende...