2017
DOI: 10.1364/ol.42.002794
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Bragg grating inscription in PMMA optical fibers using 400-nm femtosecond pulses

Abstract: In this Letter, we report the fast growth of high quality uniform Bragg gratings in trans-4-stilbenemethanol (TS)-doped poly(methyl methacrylate) (PMMA) step-index optical fibers. Grating manufacturing was obtained using a 400 nm femtosecond pulsed laser and a 1060-nm-period uniform phase mask. For 20 mW mean laser beam power, the grating reflectivity reaches 98% in ∼60  s.

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Cited by 14 publications
(16 citation statements)
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“…1. Our sensor is inscribed in step index PMMA created by the Hong Kong Polytechnic University with a core diameter of 8.2μm and a cladding diameter of 150μm [9,10]. The core and cladding are pure PMMA, with the core doped with diphenyl sulfide (5 % mole) and trans-4-stilbenemethanol (1 % w.t.).…”
Section: Methodology and Experimental Setupmentioning
confidence: 99%
“…1. Our sensor is inscribed in step index PMMA created by the Hong Kong Polytechnic University with a core diameter of 8.2μm and a cladding diameter of 150μm [9,10]. The core and cladding are pure PMMA, with the core doped with diphenyl sulfide (5 % mole) and trans-4-stilbenemethanol (1 % w.t.).…”
Section: Methodology and Experimental Setupmentioning
confidence: 99%
“…Figure 3a shows the photochemical transformation process of 4-stilbenemethanol from trans to cis structure under UV illumination [27,48], and the trans-isomer has a higher refractive index compared to cis-isomer due to the change in molecular polarity [46]. Under certain circumstances, trans-cis photoisomerization continues after UV irradiation [49], or a reverse process (cis-trans photoisomerization) occurs [29,49]. These effects could be attributed to the equilibrium between both intermediate states 𝑇 in the scheme of energy levels involved in the photoisomerization process [50], as displayed in Figure 3b.…”
Section: Tsmentioning
confidence: 99%
“…The fabrication process of POF grating devices has been reported by using different kind of lasers system such as 800 nm Ti:sapphire femto-second laser system [38], 532 nm Nd:YVO4 laser system [35], 387 nm Ti:sapphire femto-second laser system [39], 355 nm Nd:YAG laser system [40], 325 nm He-Cd laser [41], 266 nm Nd-YAG laser system [42] and 248 nm KrF excimer laser system [43]. Although 325 nm was the first irradiation wavelength for POF reported by the researchers in The University of New South Wales [44] and initially 248 nm and 266 nm wavelength were not considered suitable for POF grating writing due to high absorption of POF material at such wavelength, the first POF Bragg grating devices successful inscription less than one minutes with low flow and repetition rate 248 nm UV pulse opened a novel field of interest for POF grating irradiation [43].…”
Section: Fabrication Of Pof Grating Devicesmentioning
confidence: 99%