2003
DOI: 10.1117/12.461163
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Breakthroughs in Silicon Grism and Immersion Grating Technology at Penn State

Abstract: Fabrication of silicon grisms up to 2 inches in dimension has become a routine process at Penn State thanks to newly developed techniques in chemical etching, lithography and post-processing. The newly etched silicon grisms have typical rms surface roughness of ~ 9 nm with the best reaching 0.9 nm, significantly lower than our previous attempts (~ 20-30 nm). The wavefront quality of the etched gratings is high. Typical wavefront error is ~ 0.035 wave at 0.6328 micron, indicating diffraction-limited performance… Show more

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Cited by 7 publications
(7 citation statements)
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“…We have achieved a positioning accuracy of <0.5 m between grooves etched in the silicon, a local roughness of 1-3nm, a large-scale roughness of ~10 nm and a crystal alignment accuracy of <0.1° (Ge et al 2001(Ge et al ,2003. This has been accomplished by having very uniform etching, precision in our mask-writing, precision in photolithography and crystal alignment.…”
Section: Precision Parametersmentioning
confidence: 90%
“…We have achieved a positioning accuracy of <0.5 m between grooves etched in the silicon, a local roughness of 1-3nm, a large-scale roughness of ~10 nm and a crystal alignment accuracy of <0.1° (Ge et al 2001(Ge et al ,2003. This has been accomplished by having very uniform etching, precision in our mask-writing, precision in photolithography and crystal alignment.…”
Section: Precision Parametersmentioning
confidence: 90%
“…Our new processes should improve the grating surface quality and efficiency of the anamorphic gratings. We have also developed special tools at Penn State Nanofab for handling silicon disks with diameter up to 6 inch and thickness up to 2 inch (Ge et al, 2002b). These tools should provide an immediate step for making high resolution silicon anamorphic immersion gratings.…”
Section: Development Of a Silicon Anamorphic Immersion Gratingmentioning
confidence: 99%
“…Our new processes should improve the grating surface quality and efficiency of the anamorphic gratings. We have also developed special tools at Penn State Nanofab for handling silicon disks with diameter up to 6 inch and thickness up to 2 inch (Ge et al, 2002d). These tools should provide an immediate step for making high resolution silicon anamorphic immersion gratings.…”
Section: Development Of a Silicon Anamorphic Immersion Gratingmentioning
confidence: 99%