The technique of surface profile measurement utilizing white-light interferometry is widely used in industry. However, it has certain shortcomings, such as slow measurement speed and the possibility of error caused by a transparent film on the surface. This paper introduces four of our recent developments in white-light interferometry: 1) speed improvement by sub-Nyquist sampling, 2) accuracy improvement through the use of phase information, 3) profiling of a thick transparent film, and 4) profiling of a thin transparent film.