We demonstrate for the first time optical parametric amplification (OPA) operating at GHz rate in near-IR using hydrogenated amorphous silicon waveguide. The strong gain at this repetition rate shows its potential for telecommunication applications and a GHz-rate optical parametric oscillator.A CMOS-compatible silicon-based optical amplifier is a critical building block for on-chip interconnects. Due to its indirect bandgap nature, silicon cannot achieve optical amplification therefore many efforts have focused on utilizing its nonlinear optical effect. Using the strong Raman effect in crystalline silicon (c-Si), net off-chip gain of 13 dB has been demonstrated [1]. However, the Raman gain bandwidth is limited (∼ 1nm) due to the crystalline structure of the silicon; therefore the benefit of wide optical bandwidth cannot be utilized. Using nonlinear parametric process and dispersion engineering, broad bandwidth amplification has been reported in c-Si in the near-IR and mid-IR regime [2,3]. Recently, hydrogenated amorphous silicon (a-Si:H) has been found to posses stronger nonlinearity and higher nonlinear FOM (figure of merit) than c-Si. In the near-IR regime, gain as high as 26.5 dB [4] and gain bandwidth as broad as 55 THz [5] has been shown in a-Si:H. However, these optical amplification demonstrations were operated at a low repetition rate (∼MHz) to mitigate the two-photon absorption induced free carrier effect. In order for optical amplifiers to be useful in telecommunication applications, GHz operation is critical. Although using a reverse biased pi-n structure can sweep away the free carriers and CW Raman oscillation can be achieved [6], the fabrication processes become complicated.Here, we investigate an a-Si:H optical parametric amplifier and utilize its high nonlinear FOM for GHz-rate operation. Previously, we reported -13 dB conversion efficiency at 10 GHz and +16 dB conversion efficiency at 90 MHz [7]. In this paper, we show that on-chip amplification at 1 GHz can be achieved using our a-Si:H waveguide. This represents the first silicon OPA at telecommunications data rates.The a-Si:H waveguide is fabricated using standard CMOS manufacturing techniques as detailed in [5]. The crosssection of the fabricated waveguide is 215 nm × 500 nm and the waveguide length is 6 mm. The propagation loss of the waveguide is measured to be ∼3.5 dB/cm in TE-mode and fiber-to-chip coupling is ∼8.5 dB. The group velocity dispersion (GVD) of the waveguide is designed to be anomalous (D = 350 ps/(nm · km)), in order to obtain broadbandwidth gain.