2013
DOI: 10.1016/j.orgel.2013.02.025
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Buffer and anode-integrated WO3-doped In2O3 electrodes for PEDOT:PSS-free organic photovoltaics

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Cited by 18 publications
(4 citation statements)
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“…Most of the amorphous oxide TFTs have been developed based on the electronegativity and standard electrode potential of dopants. 58,62,65 Three decades ago, Wen et al, 80 recently Kim research group [81][82][83][84][85][86][87][88][89][90][91][92] and Parthiban et al 34,93,94 have developed high-mobility Zr-, Germanium (Ge-), Sn-, W-, Nb-, Mo-, Si-, and Ti-doped indium oxide transparent conducting thin-films, which were followed by the development of empirical relations and postulates by Zhang. 95 The empirical relationship associated with electron negativity, ionic radii, and effective charge of dopants, was proposed by Zhang and defined the function as a scale for strength of Lewis acids.…”
Section: How To Choose the Appropriate Carrier Suppressor Dopantsmentioning
confidence: 99%
“…Most of the amorphous oxide TFTs have been developed based on the electronegativity and standard electrode potential of dopants. 58,62,65 Three decades ago, Wen et al, 80 recently Kim research group [81][82][83][84][85][86][87][88][89][90][91][92] and Parthiban et al 34,93,94 have developed high-mobility Zr-, Germanium (Ge-), Sn-, W-, Nb-, Mo-, Si-, and Ti-doped indium oxide transparent conducting thin-films, which were followed by the development of empirical relations and postulates by Zhang. 95 The empirical relationship associated with electron negativity, ionic radii, and effective charge of dopants, was proposed by Zhang and defined the function as a scale for strength of Lewis acids.…”
Section: How To Choose the Appropriate Carrier Suppressor Dopantsmentioning
confidence: 99%
“…During the ion plating process, the ionized W 6+ or W 4+ ions easily substitute the In 3+ sites in the In 2 O 3 matrix and produce excess electrons in the IWO films. In addition, the screening effect of the W dopant reduced the scattering of electrons and increased the carrier mobility, as experienced in high mobility transparent conducting oxides 22,3444 . As suggested by Zhang et al ., high mobility of the In 2 O 3 -based transparent conducting oxide film could be explained by high Lewis acid strength (LAS) of transition metal dopants such as Ti 4+ , Zr 4+ , Gd 3+ , Mo 6+ , and W 6+ 45,46 .…”
Section: Resultsmentioning
confidence: 99%
“…However, each FTCE material still has critical problems to overcome to replace amorphous ITO electrodes such as the quality of TCE, scalability, possibility of mass production, and compatibility with the current device fabrication processes. Another promising FTCE scheme is high-mobility oxide TCEs such as InWO, InMoO, InZrO, InTiO, InNbO, InTaO, and InGeO films prepared by typical sputtering processes 2228 . However, the high mobility oxide TCEs prepared by low-temperature sputtering also require a high-temperature annealing process to increase the carrier mobility because the kinetic energy of atoms sputtered on the flexible substrate is quite low.…”
Section: Introductionmentioning
confidence: 99%
“…Furthermore, ITO electrodes are usually fabricated through an expensive vacuum process, such as evaporation or sputtering, and indium is very costly because reserves of the element are limited [32][33][34]. To address the problems of typical ITO electrodes, various substitutions, such as conductive polymers [35][36][37], carbon nanotubes [38,39], graphene [40,41], and metal nanowires [42,43], have been extensively investigated. Among several candidates, Ag nanowires (AgNWs) with a diameter of less than 100 nm and a length of several µm are thought to be promising materials to replace ITO films for fabrication of FTCE devices.…”
Section: Introductionmentioning
confidence: 99%